Glass film pasting technology
A technology of glass film and process, which is applied in the direction of metal material coating process, ion implantation plating, coating, etc., can solve the problems of loss of protective effect of functional layer, oxidation of glass film layer, uneven paste, etc., and achieve good protection effect , high transmittance, anti-scratch effect
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Embodiment 1
[0026] A glass film sticking process, comprising the steps of:
[0027] (1) Provide qualified glass substrates;
[0028] (2) Deposit one or more functional film layers on the surface of the glass substrate, using magnetron sputtering deposition, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the functional film system layer includes NiCr, Ag, AgCu, Si 3 N 4 、Ti 3 N 4 、TiO 2 , SnO 2 , SiO 2 , ZnO or SnZnO 3 , AlZnOx, NbOx one or more material film layers; the outermost layer of the functional film system layer is SiO 2 , the deposition thickness is 10-40nm;
[0029] (3) Deposit a layer of zirconium mixed-doped film layer on the surface of one or more functional film systems, using the method of magnetron sputtering deposition, under the working atmosphere with a vacuum order of 0.12Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the material o...
Embodiment 2
[0031] A glass film sticking process, comprising the steps of:
[0032] (1) Provide qualified glass substrates;
[0033] (2) Deposit one or more functional film layers on the surface of the glass substrate, using magnetron sputtering deposition, in a working atmosphere with a vacuum level of 0.1Pa, N 2 / O 2 It is carried out under the condition that the ratio does not exceed 8; the functional film system layer includes NiCr, Ag, AgCu, Si 3 N 4 、Ti 3 N 4 、TiO 2 , SnO 2 , SiO 2 , ZnO or SnZnO 3 One or more material film layers in , AlZnOx, NbOx; The functional film system layer is in order from the glass substrate to the outside:
[0034] The base dielectric layer plated on the glass substrate is made of titanium oxide with a thickness of 12nm;
[0035] The first barrier layer plated on the base dielectric layer is made of nickel-chromium alloy with a thickness of 4nm;
[0036] The functional layer plated on the first barrier layer is made of elemental silver with a t...
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