Preparation method of force responsiveness nanometer magnitude photonic crystal materials

A photonic crystal and responsive technology, applied in optics, optical components, instruments, etc., can solve the problems of difficulty in preparing nanometer-scale photonic crystals, limited precision level of photonic crystals, poor structure controllability, etc., and shorten the preparation cycle , short preparation cycle, and the effect of improving efficiency

Active Publication Date: 2016-12-14
SHANDONG UNIV OF SCI & TECH
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Problems solved by technology

Therefore, it is difficult to prepare nanoscale photonic crystals by laser holographic interferometry
[0008] In a nutshell, the existing preparation methods of force-responsive photonic crystal materials generally have the following disadvantages or deficiencies: complex process, long preparation cycle, and high cost; Poor structure controllability

Method used

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  • Preparation method of force responsiveness nanometer magnitude photonic crystal materials
  • Preparation method of force responsiveness nanometer magnitude photonic crystal materials
  • Preparation method of force responsiveness nanometer magnitude photonic crystal materials

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Embodiment 1

[0045] 1. Such as figure 1 As shown, the preparation steps of the quartz template with photonic crystal pattern are as follows:

[0046] (1) According to actual needs, pre-design the structural parameters of the photonic crystal, mainly including: the surface structure is a hexagonal columnar lattice, the lattice period is 200nm, the diameter of the convex column is 100nm, and the height of the convex column is 150nm. The effective area is 20×20mm 2 .

[0047] (2) According to the structural parameters of the above photonic crystals, design the structural parameters of the quartz template, mainly including: the surface structure is a hexagonal columnar hole array, the lattice period is 200nm, the diameter of the columnar holes is 100nm, and the height of the columnar holes is 150nm , The effective area is 20×20mm 2 .

[0048] (3) Take a quartz substrate (25mm×25mm in size), use electron beam lithography technology to expose the quartz substrate and the photoresist on the quartz subs...

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Abstract

The present invention discloses a preparation method of force responsiveness nanometer magnitude photonic crystal materials. Through adoption of the electron beam lithography technology and the reactive ion etch technology, a rigid template with a nanometer magnitude pattern is etched and taken as a filling template according to photonic crystal structure parameters designed in advance, high-elastic gel with good mechanical property is taken as matrix materials, and a visco-elastic polymer is taken as filling materials; and through the mode of the filling template, the photonic crystal pattern designed in advance in the high fidelity mode is transferred into the visco-elastic polymer, and the nanometer magnitude and structure controllable photonic crystal materials with force responsiveness are prepared through spin coating, stacking and the like. Compared to the current technology, the preparation method of force responsiveness nanometer magnitude photonic crystal materials is simple in technology and short in flow, technology parameters are easy to control, the template can be reused, the precision of products is high in level, the quality is stable and reliable, and the cost is low, etc.

Description

Technical field [0001] The invention relates to a method for preparing a photonic crystal material, in particular to a method for preparing a force-responsive nano-scale photonic crystal material. Background technique [0002] The preparation of the force-responsive photonic crystal material is to fill the nano-scale photonic crystal lattice gap with a highly elastic gel material with excellent mechanical properties. Through mechanical stretching or compression, the highly elastic polymer network structure will increase or decrease the photonic crystal lattice spacing, resulting in the change of diffraction wavelength and structural color, realizing the transformation of physical deformation into optical performance changes. Sensing function. [0003] Studies have shown that the multi-layer structure composed of highly elastic gel and viscoelastic polymer with nano-scale photonic crystal structure has good mechanical response properties. This kind of photonic crystal can not only...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 王清张睿郑旭马立俊张艳菊张星远杜文全
Owner SHANDONG UNIV OF SCI & TECH
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