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Crystalline silicon heterojunction solar cell

A technology of solar cells and crystalline silicon, which is applied in the field of solar cells and semiconductor devices, can solve the problems that the photoelectric conversion efficiency of the cells has not been significantly improved, the series resistance of the cells is increased, and the light absorption coefficient is large, so as to avoid the loss of photogenerated current, Increase the open circuit voltage and reduce the effect of recombination

Active Publication Date: 2016-12-21
NANCHANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although HIT solar cells can achieve a large open circuit voltage (maximum 750 mV), due to the narrow band gap and large light absorption coefficient of the amorphous silicon material used as a passivation layer and emitter, a part of sunlight is absorbed by internal defects. Much amorphous silicon absorbs and fails to convert into photogenerated current
Although the absorption of sunlight by the amorphous silicon layer can be reduced by doping the amorphous silicon with oxygen, but the oxygen doping also increases the series resistance of the battery, so the photoelectric conversion efficiency of the battery has not been significantly improved.

Method used

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  • Crystalline silicon heterojunction solar cell

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Embodiment 1

[0016] (1) Preliminary cleaning of silicon wafers, double-sided texturing.

[0017] (2) Use hydrofluoric acid to remove the oxide layer on the surface of the silicon wafer, and use plasma enhanced chemical vapor deposition to prepare an amorphous silicon passivation layer and a p-type heavily doped amorphous silicon emitter.

[0018] (3) Prepare an ITO transparent conductive layer by sputtering on the amorphous silicon passivation layer and the p-type heavily doped amorphous silicon emitter, and then prepare the Ag metal grid line.

[0019] (4) The surface of the silicon wafer is reversed, and TiO is deposited on the other side using atomic layer epitaxy x layer.

[0020] (5) Metal Ag is deposited to prepare the back electrode.

Embodiment 2

[0022] (1) Preliminary cleaning of silicon wafers, double-sided texturing.

[0023] (2) Use hydrofluoric acid to remove the oxide layer on the surface of the silicon wafer, and use hot wire chemical vapor deposition to prepare the passivation layer of amorphous silicon and the p-type heavily doped amorphous silicon emitter.

[0024] (3) The AZO transparent conductive layer was prepared by sputtering the amorphous silicon passivation layer and the p-type heavily doped amorphous silicon emitter, and then the Cu metal grid line was prepared.

[0025] (4) The surface of the silicon wafer is reversed, and TiO is prepared on the other side by chemical vapor deposition x layer.

[0026] (5) on TiO x AZO was deposited on the layer by sputtering as a transparent conductive layer to prepare Cu metal grid lines.

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Abstract

A crystalline silicon heterojunction solar cell, the structure of which starts from the light-facing surface: front electrode, TiO x Layer, crystalline silicon absorption layer, intrinsic amorphous silicon passivation layer, p-type amorphous silicon heavily doped layer, back electrode. Use n-type doped TiO on the light-facing surface x Form a heterojunction with crystalline silicon, while the backside uses a conventional amorphous silicon / crystalline silicon heterojunction structure. Due to TiO x The optical band gap is wide, and almost all the sunlight incident from the light-facing surface can enter the interior of the crystalline silicon, thereby avoiding the loss of photo-generated current due to the absorption of the window layer. In addition, TiO x It can well passivate the surface of the silicon wafer and form a good heterojunction with silicon, which helps to increase the open circuit voltage of the heterojunction cell. Therefore, the crystalline silicon heterojunction solar cell proposed by the present invention can simultaneously realize high open circuit voltage and short circuit current, and improve the photoelectric conversion efficiency of the crystalline silicon heterojunction solar cell.

Description

technical field [0001] The invention belongs to the field of solar cells and the field of semiconductor devices, and relates to the structural design of silicon solar cells. Background technique [0002] Photovoltaic power generation is an important clean energy. Under the background of global environmental pollution and energy shortage, photovoltaic power generation has developed rapidly in recent decades. However, the current cost of photovoltaic power generation is still higher than the cost of traditional power generation. To promote the popularization of photovoltaic power generation, it is necessary to reduce the preparation cost of solar cells as the main body of photovoltaic power generation and improve their photoelectric conversion efficiency. [0003] Since silicon is abundant in the earth's crust and its purification technology is relatively mature, and its optical band gap matches the solar spectrum, silicon is an ideal material for solar cell preparation. Most...

Claims

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Application Information

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IPC IPC(8): H01L31/0264H01L31/072
CPCY02E10/50H01L31/0264H01L31/072
Inventor 高超黄海宾周浪岳之浩
Owner NANCHANG UNIV
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