Glass substrate containing silica anti-reflection film and manufacturing method of glass substrate

A silicon dioxide film, silicon dioxide technology, applied in chemical instruments and methods, inorganic chemistry, silicon compounds, etc., can solve problems such as transmittance attenuation and inability to meet industrial applications.

Active Publication Date: 2017-01-04
HENAN ANCAI HI-TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

From the previous introduction, it can be known that the mesoporous structure membrane layer has strong adsorption capacity, and the surface contains a large number of hydroxyl groups, which can easily absorb water vapor in the air and cause the attenuation of transmittance, which also cannot meet the needs of industrial applications.

Method used

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  • Glass substrate containing silica anti-reflection film and manufacturing method of glass substrate
  • Glass substrate containing silica anti-reflection film and manufacturing method of glass substrate

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preparation example Construction

[0043] Compared with the prior art, the preparation method of the present invention has the following advantages:

[0044] The silicon dioxide antireflection film layer with composite structure obtained by the above preparation method can easily realize the mesoporous silicon dioxide film layer and dense silicon dioxide film layer with required thickness and refractive index. The obtained silicon dioxide anti-reflection film layer can not only improve the light transmittance, but also avoid the transmittance attenuation caused by the influence of water vapor during long-term use, and can fully meet the application requirements of photovoltaic glass for solar cells. Since the coating sol is prepared after reacting under acidic conditions and / or adding suitable surfactants, the mesoporous silica film layer thus prepared has good adhesion and high hardness, and can be prepared without alkaline conditions. The problem of poor adhesion and insufficient hardness of the porous silico...

Embodiment 1

[0049] Tetraethyl silicate, ethanol, hydrochloric acid and deionized water were mixed at a molar ratio of 1:20:0.01:2, stirred for 2 hours, and then aged at room temperature for 24 hours to obtain a prepolymer sol. Take out part of the prepolymer sol and add 2.3% cationic surfactant CTAB according to the mass ratio, and continue to stir until CTAB is completely dissolved to prepare the coating film sol.

[0050] Use a roller coater to apply the coating sol on the surface of the photovoltaic glass substrate cleaned with deionized water. The roller coater uses a 60-mesh anilox roller, the speed of the coating roller is 7.0m / min, and the conveying speed is 6.8m / min; the glass after coating Curing at 120°C for 3 minutes; then spray the second film with prepolymer sol, the nozzle is 220mm from the glass, and the nozzle pressure is 0.4MPa; after coating, cure at 120°C for 3 minutes; then send it to the tempering furnace and heat at 650°C 150 seconds. The diameter of the mesopores p...

Embodiment 2

[0052] Tetraethyl silicate, isopropanol, hydrochloric acid and deionized water were mixed at a molar ratio of 1:25:0.02:5, stirred for 2 hours, and aged at room temperature for 24 hours to obtain a prepolymer sol. Take out part of the prepolymer sol and add 2% tri-block copolymer P123 according to the mass ratio, and continue to stir until the P123 is completely dissolved to prepare the coating film sol.

[0053] Use a roller coater to apply the coating sol on the surface of the photovoltaic glass substrate cleaned with deionized water. The roller coater uses a 60-mesh anilox roller, the speed of the coating roller is 7.0m / min, and the conveying speed is 6.8m / min; the glass after coating Curing at 120°C for 3 minutes; then spray the second layer of film with prepolymer sol, the nozzle is 220mm from the glass, and the nozzle pressure is 0.4MPa; after coating, cure at 120°C for 3 minutes; then send it to the tempering furnace and heat at 640°C 160 seconds. The diameter of the m...

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Abstract

The invention relates to the technical field of an anti-reflection film, particularly to a glass substrate containing a silica anti-reflection film and a manufacturing method of the glass substrate. The glass substrate comprises glass and a silica anti-reflection film, wherein the silica anti-reflection film has a composite structure and includes a mesoporous silica film arranged on the glass and a compact silica film arranged on the mesoporous silica film. The method comprises steps of preparation of prepolymer sol and coating sol, double coating and high-temperature calcination. The transmissivity of the glass substrate is ensured, the phenomenon that the transmissivity is reduced due to water vapor in the air adsorbed by the mesoporous silica film is prevented, and the environmental stability is improved. The manufacturing method is simple to operate, equipment is easy to achieve, and the prepared film is good in adhesive force and high in hardness.

Description

technical field [0001] The invention belongs to the field of photovoltaic glass for solar cells, and in particular relates to a glass substrate containing a silicon dioxide antireflection film layer and a preparation method thereof. Background technique [0002] According to the definition of the International Union of Pure and Applied Chemistry (IUPAC), mesoporous materials refer to materials with a regularly arranged pore structure with a pore size between 2 and 50 nm. This material has the advantages of high specific surface area, orderly arrangement of pores, continuously adjustable pore size, and high porosity. It is widely used in catalysis and adsorption, separation, chemical sensors, nanomaterial microreactors, optoelectronics and other fields. Since the report of the M41S series of ordered mesoporous molecular sieves by the US Mobile Company in 1992, mesoporous materials have attracted widespread attention. [0003] Photovoltaic glass is used as the upper cover gla...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/25C01B33/145
Inventor 陈志刚魏永强杨柯陈明孙向阳马亚芬
Owner HENAN ANCAI HI-TECH
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