A method for synthesizing silicon nitride powder for laser equipment
A technology of silicon nitride powder and synthesis method, applied in the field of special ceramic materials, can solve the problems of poor thermal conductivity and product quality, etc.
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Embodiment 1
[0027] A method for synthesizing silicon nitride powder for laser equipment, the method comprising the following steps:
[0028] Add 30wt% silicon nitride powder, 45wt% silicon powder, and 25wt% polystyrene-silicon dioxide particles to a solvent mixed with water and ethanol at a volume ratio of 1:0.1, press it into a spherical shape at 0.8Mpa, and then Place in high-purity nitrogen, keep warm at 1200°C for 6 hours, sinter to obtain silicon nitride, cool to room temperature, and pulverize to obtain silicon nitride powder;
[0029] Wherein, the silicon nitride powder used above includes coarse material with a diameter of 100 μm to 1 mm and fine material with a diameter of less than 100 μm, and the ratio of coarse material to fine material is 1.3:1;
[0030] The silicon powder used includes coarse material with a diameter of 100 μm to 1 mm and fine material with a diameter of less than 100 μm, and the ratio of coarse material to fine material is 0.1:1;
[0031] The particle diam...
Embodiment 2
[0036] A method for synthesizing silicon nitride powder for laser equipment, the method comprising the following steps:
[0037] Add 30wt% silicon nitride powder, 55wt% silicon powder, and 15wt% polystyrene-silicon dioxide particles to a solvent mixed with water and ethanol at a volume ratio of 2:3, press into a spherical shape at 5Mpa, and place In high-purity nitrogen, heat at 1350°C for 8 hours, sinter to obtain silicon nitride, cool to room temperature, and pulverize to obtain silicon nitride powder;
[0038] Among them, the silicon nitride powder used above includes coarse material with a diameter of 100 μm to 1 mm and fine material with a diameter of less than 100 μm, and the ratio of coarse material to fine material is 5:1;
[0039] The silicon powder used includes coarse material with a diameter of 100 μm to 1 mm and fine material with a diameter of less than 100 μm, and the ratio of coarse material to fine material is 3:1;
[0040] The particle diameter of the polyst...
Embodiment 3
[0045] A method for synthesizing silicon nitride powder for laser equipment, the method comprising the following steps:
[0046] Add 50wt% silicon nitride powder, 40wt% silicon powder, and 10wt% polystyrene-silicon dioxide particles to a solvent mixed with water and ethanol at a volume ratio of 1:2, press it into a spherical shape at 10Mpa, and place In high-purity nitrogen, keep warm at 1600°C for 4 hours, sinter to obtain silicon nitride, cool to room temperature, and pulverize to obtain silicon nitride powder;
[0047] Wherein, the silicon nitride powder used above includes coarse material with a diameter of 100 μm to 1 mm and fine material with a diameter of less than 100 μm, and the ratio of coarse material to fine material is 10:1;
[0048] The silicon powder used includes coarse material with a diameter of 100 μm to 1 mm and fine material with a diameter of less than 100 μm, and the ratio of coarse material to fine material is 5:1;
[0049] The particle diameter of the...
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