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A water-dissolving micro-nano processing device based on atomized particles

A technology of micro-nano processing and water dissolution, which is applied in the direction of microstructure devices, manufacturing microstructure devices, and techniques for producing decorative surface effects. Processing, liquid application volume fluctuations and other issues, to avoid severe deliquescence on the surface, excellent scalability, and improve uniformity

Active Publication Date: 2017-07-21
JIANGSU JITRI JINGKAI HIGH VALUE MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the journal "Journal of Materials Science and Engineering", Volume 33, Issue 3, the document "Development of Polishing Fluid for Fine Atomization Polishing TFT-LCD Glass Substrate" introduced a chemical mechanical polishing equipment that uses ultrasonic atomization to supply liquid; the equipment The ring polishing machine is used as the processing platform, and the plexiglass container is used to seal the processing area; the polishing liquid particles after ultrasonic atomization enter the closed processing area under the negative pressure environment generated by the air compressor, and participate in the polishing of the workpiece material; The equipment improves the utilization rate of the polishing liquid and achieves a certain processing effect; however, the ultrasonic atomized polishing liquid particles reach the upper surface of the polishing pad by natural adsorption, and do not directly act on the contact area between the workpiece and the polishing pad; in addition, the atomized The lack of effective treatment of large-scale droplets generated during the transmission process of the polishing liquid is likely to cause fluctuations in the amount of liquid applied, which is not conducive to the precise ultra-precision processing of deliquescent soft and brittle functional crystals
[0005] In the published academic papers and authorized patented technologies, no example has been found that can combine the efficiency and stability of the ultrasonic atomized water dissolving micro-nano processing method in terms of functional principle and application technology

Method used

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  • A water-dissolving micro-nano processing device based on atomized particles
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  • A water-dissolving micro-nano processing device based on atomized particles

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Embodiment Construction

[0028] The specific implementation manners of the present invention will be described in detail below in combination with technical solutions and accompanying drawings. Such as Figure 1-4 As shown, a water-dissolving micro-nano processing device based on atomized particles includes a pressurized clamping unit, a mist supply and diffusion unit, and an air shower processing unit; the pressurized clamping unit is located above the mist supply and diffusion unit, and the air shower The processing unit is located between the pressurized clamping unit and the mist supply and diffusion unit;

[0029] The pressurized clamping unit includes a ball head assembly 5, a pin 4, a clamping disc 3 and a screw clamping mechanism 2; the top of the ball head assembly 5 is fixedly connected with the main shaft of the machine tool to transmit the power and load of the machine tool Pressurize the clamping unit; the bottom of the ball head assembly 5 is connected to the top of the clamping disc 3 ...

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Abstract

The invention discloses a water dissolving micro-nano machining process based on atomization particles, which comprises a pressurized clamping unit, a fog supply spreading unit and an air shower processing unit, wherein the air shower processing unit is located between the pressurized clamping unit and the fog supply spreading unit. According to the water dissolving micro-nano machining process based on the atomization particles provided by the invention, a way of matching a funnel-shaped collecting component and a processing medium spreading cavity is adopted, so that large-scaleliquid drops formed during a transmission process are effectively recovered, the influence on a crystalline material processing area of the large-scaleliquid drops is avoided, and meanwhile, uniformity and mobility of the atomization particles are improved. With a grinding and polishing plate with a hole, effective contact of the atomization particles and a crystalworkpiece processing surface is realized, and uniformity of water dissolving on the crystal workpiece processing surface is effectively improved under the matching of a processing movement trail. A micropore is of an inverted funnel structure, so that when flowing through the grinding and polishing plate with the hole, the atomization particles back flow to the processing medium spreading cavity under the action of gravity, and uniformity and stability of the atomization particles in a processing area are further ensured.

Description

technical field [0001] The invention belongs to the technical field of precision and ultra-precision processing, and relates to a micro-nano processing device suitable for soft and brittle functional crystal devices with water-soluble properties. Background technique [0002] Due to their many excellent material properties, soft and brittle functional crystals are widely used in national core strategic fields such as aerospace, national defense and military industry, information science and basic nuclear physics research. Today, with the rapid advancement of science and technology, they have attracted the attention of scholars at home and abroad. With the continuous leapfrog development of related high-tech, the requirements for the quality of micro-nano processing of this type of crystal device are increasing day by day. However, since soft and brittle functional crystals generally have difficult-to-process material properties such as soft and brittle, anisotropic, and deli...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00
CPCB81C1/00015
Inventor 高航刘子源郭东明
Owner JIANGSU JITRI JINGKAI HIGH VALUE MFG CO LTD