Printing plate, method for producing printing plate, method for manufacturing functional element and printing apparatus

A manufacturing method and technology for printing plates, applied in the preparation of printing surfaces, printing devices, printing and other directions, can solve problems such as electrical short circuit, plate contamination, resolution reduction, etc. dirty effect

Inactive Publication Date: 2017-02-22
DAI NIPPON PRINTING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In normal printing, even a very small amount of smear that is allowed will cause an electrical short circuit in the case of electronic devices, so it cannot be tolerated.
[0015] Thus, in a printing technique based on wetting or repelling (repulsion) of ink such as lithography, there are problems of resolution reduction due to penetration of solvent in photoresist during printing plate production, and The problem of plate smear caused by the penetration of solvent in the ink during continuous printing

Method used

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  • Printing plate, method for producing printing plate, method for manufacturing functional element and printing apparatus
  • Printing plate, method for producing printing plate, method for manufacturing functional element and printing apparatus
  • Printing plate, method for producing printing plate, method for manufacturing functional element and printing apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0281] [Example 1] Production of a lithographic printing plate utilizing silicone rubber

[0282] (Making of base material)

[0283] Shin-Etsu Silicone KE106 manufactured by Shin-Etsu Chemical Co., Ltd., which is a stock solution of silicone rubber, was spin-coated on a glass substrate using a spin coater MS-A100 manufactured by Mikasa Co., Ltd., and a hot plate ND-1 manufactured by AS ONE Co., Ltd. It heated at 160 degreeC for 1 hour, and the silicone rubber layer was formed. The contact angle of the silicone rubber layer with respect to pure water was measured with a contact angle meter DM-901 manufactured by Kyowa Interface Science Co., Ltd. and found to be 107±4°. In addition, when the thickness of the silicone rubber layer was measured using a standard digital caliper (Digimatic Calipers) manufactured by Mitutoyo Corporation, it was 620 μm.

[0284] The surface of the silicone rubber layer was subjected to oxygen plasma treatment using a plasma cleaner V1000 manufacture...

Embodiment 2

[0291] [Example 2] Production of a printing plate for gravure printing using silicone rubber

[0292] (Preparation of substrate and formation of hydrophobic solvent permeation prevention layer)

[0293] A substrate was produced in the same manner as in Example 1 to form a hydrophobic solvent permeation preventing layer.

[0294] (patterning of version)

[0295] In the same manner as in Example 1, a resist pattern was formed on the surface of the hydrophobic solvent penetration preventing layer.

[0296] Using the plasma cleaner V1000 manufactured by Yamato Scientific Co., Ltd., the hydrophobic solvent permeation prevention layer and the silicone rubber layer formed with the resist pattern are treated with oxygen and CF. 4 After the plasma generated by the mixed gas is treated, the oxygen plasma treatment is directly performed without opening in batches. At this time, in the opening of the resist pattern, the hydrophobic solvent permeation prevention layer is removed by perf...

Embodiment 3

[0301] [Example 3] Preparation of an electrode for an organic thin film transistor (OTFT, Organic Thin Film Transistor)

[0302] (production of print edition)

[0303] A printing plate for lithographic printing was produced in the same manner as in Example 1 except that a photomask having a pattern corresponding to a source electrode and a drain electrode of an OTFT was used. On the surface of the plate, regions corresponding to source electrodes and drain electrodes are hydrophobic regions, and other regions are hydrophilic regions.

[0304] (Making of blanket layer)

[0305] The surface of polyethylene naphthalate (PEN, PolyethyleneNaphthalate) film Q65FA manufactured by Teijin Dupont Co., Ltd. was cleaned by vacuum ultraviolet light treatment using a light irradiation device UER616908-172 manufactured by Ushio Electric Corporation. Next, uncured silicone rubber KE106 manufactured by Shin-Etsu Silicones was spin-coated on the PEN film using a spin coater MS-300 manufacture...

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Abstract

The main purpose of the present invention is to provide: a printing plate that has excellent transferability, printing durability and resolution; a method for producing a printing plate; a method for manufacturing a functional element using the printing plate; and a printing apparatus using the printing plate. The present invention achieves the above-mentioned purpose by providing a printing plate which is characterized by comprising: a base that contains an elastic body that is swellable in a solvent; a hydrophobic solvent permeation prevention layer that is formed as a pattern on the base; and a hydrophilic part that is formed on the base surface in an opening part of the hydrophobic solvent permeation prevention layer and has higher hydrophilicity than the hydrophobic solvent permeation prevention layer.

Description

technical field [0001] The present invention relates to a printing plate for waterless lithography or gravure printing, a method for manufacturing the same, a method for manufacturing functional elements using the printing plate for waterless printing, and a printing device. Background technique [0002] With the improvement of manufacturing technology of electronic devices, fine functional layers can be formed, which contributes to the popularization of small and highly portable devices such as smartphones and tablet terminals. [0003] The manufacture of electronic devices is mainly performed by a technique called photolithography. In the photolithography method, a protective layer is formed in a pattern on a functional layer formed on a substrate, and the functional layer exposed from the opening of the protective layer is removed by etching or the like. That is, photolithography is a method of patterning by removing unnecessary parts, and is a subtractive method. In co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41N1/14B41C1/10B41F3/34B41M1/06B41N1/06G03F7/00H05K3/12
CPCB41F3/34B41N1/14G03F7/00H05K3/12B41C1/1008B41N1/003B41N3/003B41N3/032B41C2210/16B41N1/12
Inventor 金泽周介
Owner DAI NIPPON PRINTING CO LTD
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