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Molecular beam epitaxy under strong vector magnetic field and its in-situ characterization device

A molecular beam epitaxy and strong magnetic field technology, which is applied in the manufacturing/processing of measurement devices, electromagnetic devices, and measurement of magnetic variables, etc. The test system has many components and overcomes the effect of small size

Active Publication Date: 2018-11-20
XIAMEN UNIV
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Problems solved by technology

[0004] However, the size of the room temperature cavity of existing strong magnets is small (usually the inner diameter is less than 10 cm), and to realize the fine growth of magnetic thin film materials (multiple evaporation sources or ion sources) and in-situ characterization at the same time, it is necessary to install in the cavity Multiple components, multiple system functions and complex structure

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  • Molecular beam epitaxy under strong vector magnetic field and its in-situ characterization device
  • Molecular beam epitaxy under strong vector magnetic field and its in-situ characterization device
  • Molecular beam epitaxy under strong vector magnetic field and its in-situ characterization device

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Embodiment Construction

[0021] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments, but the scope of protection of the present invention is not limited to the following embodiments.

[0022] The invention is equipped with a strong magnet, an inverted T-shaped ultra-high vacuum growth and characterization chamber, an epitaxial growth sample stage and a linkage control system, an in-situ characterization and control device, a molecular beam furnace source, a vacuum system, and a probe detection device.

[0023] The strong magnet is a helical strong magnet without external liquid helium with a room temperature cavity. The inner diameter of the room temperature cavity is less than 10 cm. The strong magnet can provide a magnetic field with a magnetic induction intensity up to 15T and a uniformity of 0.1%.

[0024] The part of the inverted T-shaped ultra-high vacuum growth and characterization chamber placed in the room temperature chamber of...

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Abstract

A device for molecular beam epitaxy and its in-situ characterization under a strong vector magnetic field, relating to molecular beam epitaxy and its in-situ characterization. Provides molecular beam epitaxial growth with adjustable angle between the sample growth plane and the magnetic field under ultra-high vacuum strong magnetic field, and in-situ characterization equipment mainly based on Hall effect and magnetoresistance testing. The device is mainly composed of a compact inverted T-shaped ultra-high vacuum growth and characterization chamber and a strong magnet with a small room temperature chamber. Among them, the inverted T-shaped vacuum chamber part placed in the room temperature cavity of the strong magnet includes a compact epitaxial growth sample stage, an adjustable angle between the magnetic field and the sample stage, and an in-situ characterization device; the part placed under the strong magnet includes the evaporation source, plasma The molecular beam source components such as the volume source and the vacuum pumping system make use of the long free path of the molecular beam in ultra-high vacuum, so that the multi-beam source can be moved out of the strong magnetic field cavity. It effectively overcomes the technical difficulties of the small size of the strong magnetic field cavity and the many components of the growth test system, and realizes the molecular beam epitaxy growth and in-situ characterization under the strong magnetic field.

Description

technical field [0001] The invention relates to molecular beam epitaxy and its in-situ characterization, in particular to a molecular beam epitaxy and its in-situ characterization device under a vector strong magnetic field. Background technique [0002] With the rapid development of information science, people have put forward higher requirements for parameters such as operating speed, data storage density and power consumption of electronic components. Existing electronic components represented by integrated circuits or VLSIs only manipulate the degree of freedom of electronic charge, while ignoring the other basic quantum property of electronic spin, which leads to its size, integration, etc. All have basically reached the physical limit determined by the theory. The quantum control of electron spin is beneficial to fast data processing, reducing power consumption, improving integration, etc., and has become an emerging important branch of semiconductor physics. [0003...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B30/04C30B23/02C30B29/02G01R33/07G01R33/09H10N50/01
CPCC30B23/02C30B29/02C30B30/04G01R33/07G01R33/09C30B23/002C30B23/06H01L22/14H10N50/01C30B23/025H01L21/02631
Inventor 康俊勇张纯淼吴志明陈婷高娜吴雅苹李恒
Owner XIAMEN UNIV