Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method for Fe Mn alloy nanometer thin films with high exchange biasing effect

A technology of alloy nanometer and bias effect, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of controlling film size and thickness, complex alloy film process, unstable reaction conditions, voltage and current, etc. problems, to achieve the effect of controlling the grain size, large exchange bias effect, and reducing the interface reaction

Inactive Publication Date: 2017-05-17
INNER MONGOLIA UNIVERSITY
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are certain defects in the preparation of alloy films by physical methods. The process of preparing alloy films by PLD method is complicated, and the size and thickness of film growth cannot be controlled during the growth process.
Although the operation process of alloy thin film prepared by magnetron sputtering is relatively simple, the size and thickness of the film cannot be controlled during the growth process.
The preparation of alloy thin films by MBE method is more complicated, the growth cycle is too long, and the size and thickness of the thin films cannot be controlled during the growth process.
[0005] Chemical methods to prepare thin films also have drawbacks
Due to the limitations of the preparation process, the first method of preparation cannot reach the nanometer size of the film; although the second method can effectively overcome the limitation of the film size, the voltage and current of the reaction conditions during the preparation of the film may be unstable, resulting in the preparation of nanomaterials. Inhomogeneity affects performance; the third process can also effectively overcome the limitation of film size, but because it usually has certain requirements for raw materials, products and reaction types, it cannot meet the requirements for preparing FeMn alloy nano film

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for Fe Mn alloy nanometer thin films with high exchange biasing effect
  • Preparation method for Fe Mn alloy nanometer thin films with high exchange biasing effect
  • Preparation method for Fe Mn alloy nanometer thin films with high exchange biasing effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] The preparation of FeMn alloy nano-films under annealing conditions, test the hysteresis loops of FeMn alloy nano-films at temperatures of 70K, 100K, 150K, 200K, 250K, 298K.

[0040] The following raw materials (with a purity of over 99.999%) are used to prepare nano-assembled FeMn alloy films using an improved pre-sputtering half-hour target method;

[0041] The following is the specific method for preparing FeMn alloy nano film with strong exchange bias effect

[0042] 1.1): A FeMn alloy target with a purity of 99.999%, a thickness of 2mm and a diameter of 50mm is used as a sputtering target, an Ar with a purity of 99.999% is used as a sputtering gas, and a thickness of 500μm, 10mm*10mm (100) silicon The sheet serves as the substrate.

[0043] 1.2): Soak the dust-free paper in step 1 in the absolute ethanol in step 1 for 10 seconds, wipe the impurities in the cluster condensation cavity with the dust-free paper soaked in absolute ethanol, and wipe clean the impurities in the ...

Embodiment 2

[0052] Prepare FeMn alloy nano-films with strong exchange bias effect under annealing conditions, and test the hysteresis loops of FeMn alloy nano-films at temperatures of 5K, 15K, 20K, 25K, 30K, 40K, and 50K.

[0053] The following raw materials (with a purity of more than 99.999%) were used to prepare nano-assembled FeMn alloy films using an improved pre-sputtering half-hour target method; considering that FeMn alloy nano-films are easy to oxidize under high temperature conditions, 400 in an argon atmosphere In-situ annealing at ℃ for 15min to prevent the composition of FeMn alloy nano film from changing.

[0054] The specific method is:

[0055] 2.1): A FeMn alloy target with a purity of 99.999%, a thickness of 2mm and a diameter of 50mm is used as a sputtering target, an Ar with a purity of 99.999% is used as a sputtering gas, and a (100) silicon with a thickness of 500μm and 10mm*10mm The sheet serves as the substrate.

[0056] 2.2): Soak the dust-free paper in step 1 in the abs...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method for Fe Mn alloy nanometer thin films with the high exchange biasing effect and belongs to the field of metal nanometer thin film preparation. Fe Mn alloy freedom clusters with the size being of the nanometer scale are prepared firstly, then the processes of collision, condensation and concretion are conducted in cavities of the clusters, and the Fe Mn alloy freedom clusters changes into Fe Mn alloy supporting clusters; and the Fe Mn alloy supporting clusters are attached to the surfaces of clean and smooth underlayers, assembling of the Fe Mn alloy clusters is completed on the surfaces of the underlayers, and thus the Fe Mn alloy nanometer thin films with nano-structures are obtained. According to the preparation method for the Fe Mn alloy nanometer thin films with the high exchange biasing effect, by adopting the cluster beam sedimentation method, the clusters are deposited into the Fe Mn alloy nanometer thin films in a soft landing mode, generation of inner stress is reduced, cluster assembling is achieved, a particular structure is obtained, and selection and control of the sizes and components of nanometer particles are achieved; and the prepared Fe Mn alloy nanometer thin films have the advantages of being high in exchange biasing effect, smooth and compact and high in density.

Description

Technical field [0001] The invention relates to a method for preparing FeMn alloy nano film with strong exchange bias effect, and belongs to the field of metal nano film preparation. Background technique [0002] The exchange bias effect was first discovered by Meikleijohn and Bean in the core-shell structure of Co in 1956. After the ferromagnetic (FM) / antiferromagnetic (AFM) interface is cooled from higher than the antiferromagnetic Nell temperature to a low temperature in an external magnetic field, the hysteresis loop of the ferromagnetic layer will deviate from the origin along the direction of the magnetic field, and its offset will be It is called the exchange bias field. The exchange bias effect is widely used in low-power memory and spintronic devices, spin valve giant magnetoresistance devices and magnetic recording. The exchange bias effect mainly exists in the ferromagnetic (FM) / antiferromagnetic (AFM) bilayer film with FeMn alloy as the antiferromagnetic layer, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/16
CPCC23C14/165C23C14/35
Inventor 赵世峰张冠群白玉龙李明浩
Owner INNER MONGOLIA UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products