Magnetically Deflected Electron Beam Evaporation Source

Abstract

The invention discloses a magnetic-deflection electron beam evaporation source which comprises an electron beam generating mechanism, a magnetic deflection assembly, a water-cooled crucible mechanism, a linear transposition mechanism and a working circuit, wherein the electron beam generating mechanism is the core mechanism, and mainly comprises a lamp filament, a lamp filament base, a ceramic sheet, a ceramic base, a supporting block, a ceramic column, a cathode shielding cover and the like. A lamp filament heating mode is adopted to emit hot electrons, and the hot electrons fly to an anode after being accelerated by electric fields between a cathode and the anode; in order to increase evaporation velocity, the cathode shielding cover can be adopted to shield interferences, on electrons emitted by the lamp filament, of magnetic fields generated by a permanent magnet below, and also can be used as a control electrode for regulating the sizes of beam spots; a cooling structure adopts a double-layer water-cooling structure, and a cooling inner barrel in a cooling outer barrel is used for directly feeding cooling water to an oxygen-free copper crucible; and a to-be-evaporated film material is positioned in an oxygen-free copper crucible lining, and the adopted crucible lining can be adopted for enabling temperature distribution of the whole smelting tank to be uniform.

Description

technical field [0001] The invention relates to the field of ultra-high vacuum equipment, in particular to a magnetic deflection electron beam evaporation source. Background technique [0002] In the production process of semiconductor integrated circuits, sensors and solar panels, many structures need to be produced by vacuum coating technology. Therefore, vacuum coating directly determines the quality of products such as semiconductors and solar panels. The research and application of vacuum coating are inseparable from its production equipment, so the research and development of evaporation source is of great significance. [0003] At present, the main vacuum coating technologies at home and abroad include vacuum evaporation coating, vacuum sputtering coating, and vacuum ion coating, among which vacuum evaporation coating is the most widely used. Vacuum evaporation coating technology, that is, in a high vacuum or ultra-high vacuum chamber, the film material (such as met...

AI Technical Summary

Problems solved by technology

The 180° and 225° deflection evaporation source filament will still be polluted by the evaporator in the crucible, and the effect is not good

Due to the thermal electron bombardment of the inner film material of the crucible, the temperature of the crucible rises sharply (up to 2000 ℃ ~ 6000 ℃), the structure of the traditional cooling mechanism is complex, the heat dissipation effect is not good, and the temperature control ability is poor, which greatly affects the performance of the film.

In addition, the vast majority of magnetic deflection evaporation sources at home and abroad at present use energized magnetic coils to generate deflection magnetic fields. Magnetic coils are energized and generate heat, which is very easy to produce impurities and electrons to pollute the filament and film.

[0006] At present, there is no domestically produced magnetic deflection electron beam evaporation source in China

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