Semiconductor structure and formation method therefor
A semiconductor, multi-layer structure technology, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., can solve the problem of easy cracking of the dielectric layer, achieve easy cracking, reduce the probability of cracking, low stress effect
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[0036] There are many problems in the semiconductor structure in the packaging process of the prior art, for example, the dielectric layer in the semiconductor structure is easy to crack.
[0037] In the prior art packaging process, the dielectric layer is usually a silicon nitride layer. In the process of forming the silicon nitride layer, the reactants include gas containing hydrogen atoms, which easily makes the silicon-hydrogen bond in the formed silicon nitride layer The content is higher. However, the silicon-hydrogen bond is unstable, and it is easy to break during the high-temperature process during the formation of the semiconductor structure. As a result, more dangling bonds are formed in the silicon nitride layer, resulting in poor stability of the silicon nitride layer and easy occurrence of cracks. In addition, the silicon nitride layer with high silicon-hydrogen bond content is prone to warping and deformation, resulting in cracking of the silicon nitride layer ...
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