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Method for preparing semiconductor BiOxCly type photocatalyst by utilizing industrial wastewater

A technology of industrial wastewater and photocatalyst, which is applied in physical/chemical process catalysts, chemical instruments and methods, water/sludge/sewage treatment, etc. It can solve the problem of unstable effluent quality, long time-consuming period, and difficult sludge treatment And other issues

Active Publication Date: 2017-07-28
CHINA THREE GORGES UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing methods of treating industrial wastewater mainly revolve around the A 2 A series of improved processes based on the / O process, but the large amount of sludge generated by its degradation is difficult to deal with, and at the same time it takes a long time and the resource recycling rate is extremely low, which is inconsistent with the circular economy and environmental protection economy advocated in the world today.
Due to the high salt content in industrial wastewater, it is extremely difficult for microorganisms to survive in this environment, which also has a huge impact on the traditional biochemical treatment of high-salt wastewater, resulting in unstable effluent quality

Method used

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  • Method for preparing semiconductor BiOxCly type photocatalyst by utilizing industrial wastewater
  • Method for preparing semiconductor BiOxCly type photocatalyst by utilizing industrial wastewater
  • Method for preparing semiconductor BiOxCly type photocatalyst by utilizing industrial wastewater

Examples

Experimental program
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Effect test

Embodiment 1

[0027] Add 5 parts of 0.97g of bismuth nitrate pentahydrate to 5 parts of 80mL glyphosate industrial wastewater mother liquor from the glyphosate project production line of Xingfa Group, and ultrasonically And stir for 30 minutes, so that bismuth nitrate pentahydrate is evenly dispersed in the industrial wastewater solution; then all the obtained mixed solution of industrial wastewater and bismuth nitrate pentahydrate is transferred to a 100mL reactor, and the reactor is tightened; the reactor is placed in JXF12- In a 100-type homogeneous reactor, the BiO 1.53 Cl 0.89 、BiO 1.68 Cl 1.04 、BiO 1.70 Cl 0.92 、BiO 2.09 Cl 0.83 、BiO 1.56 Cl 0.81 A total of 5 kinds of photocatalysts; then the cooled reactor was taken out, the mixed solution was taken out and washed with deionized water for 3 times, and then suction filtered, and the prepared BiO x Cl y type semiconductor photocatalyst. Put the prepared semiconductor photocatalyst into an electric drying oven and dry for 2h ...

Embodiment 2

[0030] Add 5 parts of 0.97g of bismuth nitrate pentahydrate to 5 parts of 80mL glyphosate industrial wastewater mother liquor from the glyphosate project production line of Xingfa Group, and ultrasonically And stir for 30 minutes, so that bismuth nitrate pentahydrate is evenly dispersed in the industrial wastewater solution; then all the obtained mixed solution of industrial wastewater and bismuth nitrate pentahydrate is transferred to a 100mL reactor, and the reactor is tightened; the reactor is placed in JXF12- In a 100-type homogeneous reactor, the BiO 2.50 Cl 0.31 、BiO 1.38 Cl 0.82 、BiO 1.70 Cl 0.92 、BiO 1.75 Cl 0.58 、BiO 1.82 Cl 0.21 A total of 5 photocatalysts; then the cooled reactor was taken out, the mixed solution was taken out and washed with deionized water for 3 times and then suction filtered, and the prepared semiconductor BiO x Cl y type photocatalyst. Put the prepared photocatalyst into an electric drying oven and dry it for 2h to obtain the desired...

Embodiment 3

[0033] Add 2 parts of 0.97g of bismuth nitrate pentahydrate to 80mL of glyphosate industrial wastewater mother liquor and 1.4625g / L sodium chloride solution from the glyphosate project production line of Xingfa Group, respectively. Ultrasonic and stir in a high-frequency numerically controlled ultrasonic machine for 30 minutes, so that bismuth nitrate pentahydrate is evenly dispersed in the solution; then all the mixed solution obtained is transferred to a 100mL reactor, and the reactor is tightened; the reactor is placed in a JXF12-100 In a homogeneous reactor, reacted at 140 °C for 10 h and then cooled to room temperature naturally to obtain BiO 1.70 Cl 0.92 Semiconductor photocatalyst and bismuth oxychloride semiconductor photocatalyst; Then take out the reactor after cooling, take out the solution wherein and wash with deionized water 3 times and then suction filter, on the filter paper are prepared 2 kinds of semiconductor photocatalysts. Put the prepared two kinds of se...

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Abstract

The invention provides a method for preparing a semiconductor BiOxCly type photocatalyst by utilizing industrial wastewater. The method comprises the following steps: adding bismuth nitrate pentahydrate to industrial wastewater, ultrasonicateing and stirring for 30 minutes in an ultrasonic machine with a power of 100 Hz to uniformly disperse the bismuth nitrate pentahydrate industrial wastewater; then transferring all the mixed solution of industrial wastewater and bismuth nitrate pentahydrate to a reaction kettle, tightening the reaction kettle and then placing in a homogeneous reactor, and heating under certain conditions to prepare the high-photocatalytic-activity semiconductor BiOxCly type photocatalyst. The photocatalytic activity of the semiconductor BiOxCly type photocatalyst prepared by the invention under ultraviolet irradiation is much higher than that of a P25 type titanium dioxide and bismuth oxychloride semiconductor photocatalyst; the pollutants difficult to treat such as COD (Chemical Oxygen Demand) and sodium chloride in the wastewater are obviously reduced, and the total phosphorus is mostly converted into orthophosphate in the preparation process of the semiconductor BiOxCly type photocatalyst.

Description

technical field [0001] The patent of the invention relates to a method for preparing semiconductor BiO by using industrial wastewater x Cl y A photocatalyst method belongs to the technical field of environmental material preparation. Background technique [0002] Industrial wastewater is the product of the rapid development of the world economy. Because of its high sodium chloride content, high COD, high ammonia nitrogen, high phosphorus content and other properties that are difficult to degrade, it has always been a major problem in the world's environmental pollution control. The current existing methods for treating industrial wastewater mainly revolve around A 2 A series of improved processes based on the / O process, but the large amount of sludge generated by its degradation is difficult to deal with, and at the same time it takes a long time and the resource recycling rate is extremely low, which is inconsistent with the circular economy and environmental protection ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/06C02F1/30
CPCC02F1/30B01J27/06C02F2305/10B01J35/39
Inventor 黄应平姚坤王灿马会娟李永刚王瑞宝贾漫珂
Owner CHINA THREE GORGES UNIV
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