Negative-type photosensitive resin composition
A technology of photosensitive resin and composition, which is applied in optics, optomechanical equipment, nonlinear optics, etc., can solve the problems of no durability, etc., and achieve the effects of excellent adhesion, excellent chemical resistance and storage stability
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preparation example 1
[0157] Preparation Example 1: Preparation of Alkali-Soluble Resin (First Resin (A-1))
[0158] In a 1L flask with a reflux condenser, a dropping device (hereinafter referred to as dropping funnel) and a stirrer, nitrogen gas was introduced at 0.02L / min (minutes) to form a nitrogen atmosphere, and then 200g of propylene glycol monomethyl ether was added thereto. esters. After heating up to 100° C., a mixture containing 25.2 g (0.35 mol) of acrylic acid, 4.7 g (0.05 mol) of norbornene, 70.9 g (0.60 mol) of vinyl toluene and 150 g of propylene glycol monomethyl ether acetate was added. Then, a solution prepared by dissolving 3.6 g of 2,2'-azobis(2,4-dimethylvaleronitrile) in 150 g of propylene glycol monomethyl ether acetate was added dropwise from the dropping funnel to The flask was further stirred at 100 °C for 5 h.
[0159] Subsequently, the atmosphere in the flask was changed from nitrogen to air, and 28.4 g [0.20 mol (based on 57 mol% of the acrylic acid used in this reac...
preparation example 2
[0160] Preparation Example 2: Preparation of Alkali-Soluble Resin (Second Resin (A-2))
[0161] In a 1L flask with a reflux condenser, a dropping funnel, and a stirrer, introduce nitrogen gas at 0.02L / min to form a nitrogen atmosphere, then add 150g of diethylene glycol methyl ethyl ether thereinto, and heat to 70°C with stirring . Subsequently, 132.2g (0.60mol) of the mixture of the following chemical formula a and chemical formula b (molar ratio: 50:50), 55.3g (0.30mol) of methacrylic acid (3-ethyl-3-oxetanyl) methyl The ester and 8.6 g (0.10 mol) of methacrylic acid were dissolved in 150 g of diethylene glycol methyl ethyl ether to prepare a solution.
[0162] [chemical formula a]
[0163]
[0164] [chemical formula b]
[0165]
[0166] Use the dropping funnel to drop the prepared solution into the flask, and dissolve 27.9g (0.11mol) of the polymerization initiator 2,2'-azobis(2,4-dimethylvaleronitrile) in 200g of diethylene glycol in ethyl ethyl ether. The disso...
Embodiment 1 to 9 and comparative example 1 to 5
[0167] Examples 1 to 9 and Comparative Examples 1 to 5: Preparation of Photosensitive Resin Compositions
[0168] The components were mixed based on the components and compositions shown in Table 1 below, and stirred for 3 hours to prepare a photosensitive resin composition (unit: weight %).
[0169] [Table 1]
[0170]
[0171] A-1: Resin obtained in Preparation Example 1
[0172] A-2: Resin obtained in Preparation Example 2
[0173] B: Dipentaerythritol hexaacrylate (KAYARAD DPHA, Nippon Kayaku Co., Ltd.)
[0174] C: Oxime ester photopolymerization initiator OXE-01 (BASF)
[0175] D-1: 3-triethoxysilyl-N-(1,3-dimethylbutylene) propylamine
[0176] D-2: 3-(ethoxydimethylsilyl)-N-(pentane-3-ylidene)propan-1-amine
[0177] D-3: 3-(methoxydimethylsilyl)-N-(pentane-3-ylidene)propan-1-amine
[0178] D-4: 3-(ethoxydimethylsilyl)-N-(propan-2-ylidene)propan-1-amine
[0179] D-5: 3-(ethoxy(ethyl)(methyl)silyl)-N-(propane-2-ylidene)propan-1-amine
[0180] D-6: 3-(butyl(ethoxy...
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