A water-phase electrodeposition device and its application to the method for preparing uranium targets on the front and back sides of a tantalum sheet

Abstract

The invention provides an aqueous phase electro-deposition device and a method for preparing uranium targets on the front and back surfaces of a tantalum sheet by using the same. The method comprises the following steps that (1) pretreatment of the metal tantalum sheet: the metal tantalum sheet is subjected to double-sided grinding and coursing, grinding, polishing, degreasing and cleaning; (2) mounting of the tantalum sheet: uranium can be electrically deposited on the front and back surfaces of the tantalum sheet, the size and shape of uranium layers can be changed flexibly, and the aqueous phase electro-deposition device can also be applied to other electro-deposition experiments; and (3) the electro-deposition process: an ammonium oxalate aqueous solution serves as an electro-deposition solution; electro-deposition parameters such as the pH value, the temperature, the current density and the deposition time are controlled; 1-10 mg of even and firm uranium targets are prepared on the front and back surfaces of the tantalum sheet with the thickness of 100 microns and with the active areas with the diameter being 20-50 microns respectively. The aqueous phase electro-deposition device and the preparation method have the advantages that operation is and convenient, and conditions are easily controlled; no harmful gas and no hazardous substances are generated in the reaction process; and environmental friendliness is realized. The uranium targets prepared through the method are smooth and compact in surface, firm in bonding to the tantalum sheet and good in property. The electro-deposition yield is greater than or equal to 90%.

Description

technical field [0001] The invention relates to an electrodeposition device and an electrodeposition process for preparing uranium targets on the front and back sides of a tantalum sheet. Background technique [0002] The development of fission target is very important for nuclear data measurement. It requires large fission target area, uniform target and thin substrate material, so as to ensure uniform electric field distribution in measurement and more reliable measurement data. With a large-area high-purity tantalum sheet with a thickness of 100 μm as the substrate, 235 U 238 The fission target prepared with U as the target source has important applications in nuclear data measurement. The double-sided uranium fission target can double the measurement efficiency and is often used in nuclear data measurement. [0003] Generally, there are three main methods for uranium target preparation: ion sputtering, vacuum evaporation and electrodeposition. However, because uraniu...

AI Technical Summary

Problems solved by technology

At present, some of the conventional electrodeposition processes for preparing uranium thick targets require multiple depositions, and the experimental operation is relatively cumbersome; some require pre-deposition, and other impurities are easily introduced to affect the measurement; Peeling, falling powder, unsafe to use and the thickness of the uranium layer cannot be quantified

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