Preparation method for TFT-LCD substrate glass
A substrate and glass technology, which is applied in the introduction method and glass preparation field, can solve the problems of high melting temperature and high glass viscosity, and achieve the effects of lower annealing temperature, short holding time and low thermal expansion coefficient
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Embodiment 1
[0027] The invention provides a method for introducing glass strontium on a TFT-LCD substrate and a method for preparing the glass, comprising the following steps:
[0028] S1. Configure glass raw materials. The glass raw materials mainly contain the following components (wt%): 65SiO 2 -15Al 2 o 3 -6B 2 o 3 -4CaO-4MgO-6SrO, additionally add suitable clarifying agent. Weigh the glass raw material SiO according to the above glass composition 2 、Al 2 o 3 , B 2 o 3 , CaCO 3 , MgCO 3 and nano-SrCO 3 , respectively 325g, 75g, 30g, 35.7g, 41.8g and 42.7g, the above glass raw materials are all chemically pure as raw materials except nano strontium carbonate.
[0029] S2. Fully mix the glass raw material in step S1 evenly, and add it into a platinum crucible.
[0030] S3. Put the platinum crucible in step S2 in a box-type silicon-molybdenum rod high-temperature electric furnace to melt according to the set temperature system, (1) set an appropriate heating rate to increase...
Embodiment 2
[0036] The invention provides a method for introducing glass strontium on a TFT-LCD substrate and a method for preparing the glass, comprising the following steps:
[0037] S1. Configure glass raw materials. The glass raw materials mainly contain the following components (wt%): 65 SiO 2 -15Al 2 o 3 -6B 2 o 3 -3CaO-4MgO-7SrO, add a suitable clarifying agent. Weigh the glass raw material SiO according to the above glass composition 2 、Al 2 o 3 , B 2 o 3 , CaCO 3 , MgCO 3 and nano-SrCO 3, respectively 325g, 75g, 30g, 26.7g, 41.8g and 49.8g, the above glass raw materials are all chemically pure as raw materials except nano-strontium carbonate. Steps S2-S4 are the same as those in Embodiment 1. Finally, high alumina alkali-free borosilicate glass is obtained. The glass is then tested for high-temperature viscosity, thermal expansion, and density.
[0038] The melting temperature in step S3 is 1660° C., and the melting holding time is 2 hours.
[0039] The annealing ...
Embodiment 3
[0044] The invention provides a method for introducing glass strontium on a TFT-LCD substrate and a method for preparing the glass, comprising the following steps:
[0045] S1. Configure glass raw materials. The glass raw materials mainly contain the following components (wt%): 65SiO 2 -15Al 2 o 3 -6B 2 o 3 -2CaO-4MgO-8SrO, additionally add a suitable clarifier. Weigh the glass raw material SiO according to the above glass composition 2 、Al 2 o 3 , B 2 o 3 , CaCO 3 , MgCO 3 and nano-SrCO 3 , respectively 325g, 75g, 30g, 17.8g, 41.8g and 57g, the above glass raw materials are all chemically pure as raw materials except nano strontium carbonate. Steps S2-S4 are the same as those in Embodiment 1. Finally, high alumina alkali-free borosilicate glass is obtained. The glass is then tested for high-temperature viscosity, thermal expansion, and density.
[0046] The melting temperature in step S3 is 1660° C., and the melting holding time is 2 hours.
[0047] The anneal...
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