Method utilizing ultraviolet oxidation in implementing and regulating graphene film patterning

A technology of graphene film and ultraviolet light, which is applied in the direction of electrical components, nanotechnology, electric solid devices, etc., can solve the problems of high distortion of graph structure and damage of graphene surface near the edge, so as to achieve convenient cost, improve quality, The effect of high graphics precision

Active Publication Date: 2018-01-19
SHANGHAI JIAO TONG UNIV
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Problems solved by technology

However, due to the enhanced diffusion ability of oxygen excitons in the process of high-temperature ultraviolet light oxidation,

Method used

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  • Method utilizing ultraviolet oxidation in implementing and regulating graphene film patterning
  • Method utilizing ultraviolet oxidation in implementing and regulating graphene film patterning
  • Method utilizing ultraviolet oxidation in implementing and regulating graphene film patterning

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Experimental program
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Embodiment

[0049] The method for realizing and regulating the patterning of graphene film by ultraviolet photooxidation comprises the following steps:

[0050] Step 1, place a hard mask plate with a certain pattern structure such as a ferromagnetic stainless steel plate (thickness 50 μm) closely on the SiO2 film transferred with a graphene film 2 / Si substrate.

[0051] Step 2, place the graphene film and the hard mask plate in step 1 together in the ultraviolet light oxidation equipment with the xenon lamp excimer discharge tube as the light source, adjust the distance between the sample and the lower surface of the xenon lamp excimer discharge tube to be 20mm, oxygen The pressure is 10 Pa, the vacuum chamber is filled with nitrogen and the pressure is 1 atm, and the xenon lamp excimer light source is irradiated for 15 minutes.

[0052] Step 3, place the graphene film and the hard mask plate in step 1 at either end of the S-N pole of the NdFeB permanent magnet whose surface magnetic fi...

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Abstract

Provided in the invention is a method for utilizing ultraviolet oxidation in implementing and regulating graphene film patterning, comprising: a step 1: utilizing a xenon lamp excimer ultraviolet oxidation method and a hard mask in implementing graphene film microstructure graphic patterning; a step 2: by applying a nonuniform magnetic field in the perpendicular direction to the surface of a graphene film, controlling oxygen excitons to move in the direction of the magnetic field towards the graphene film, thus enhancing the directionality of etching the graphene film in the perpendicular direction, and increasing the quality of graphene film microstructure patterning; and a step 3: by adjusting the strength and direction of the magnetic field (such as in the horizontal direction), controlling the directionality of the movement of the oxygen excitons, and regulating the shape being etched on the graphene film graphic structure, thus achieving the goal of regulating graphene film patterning. The method of the invention implements and regulates a micrometer graphic structure array, is suitable for large-area graphene film patterning, free of photoresist contamination, and inexpensive, and provides a patterned graphene film of high quality.

Description

technical field [0001] The invention relates to the technical field of graphene film preparation, in particular to a method for realizing and regulating graphene film patterning by ultraviolet light oxidation. Background technique [0002] Graphene film has excellent carrier mobility, broadband optical transmittance, thermal conductivity and flexibility. As a new material, it has important application prospects in the fields of photons and optoelectronics such as flexible display devices, detector devices, and solar cells. From the birth of single-layer graphene electronic components to the gradual industrialization of large-area graphene films, the patterning of graphene films, that is, the preparation of units and arrays of certain geometric structures or functional structures, is one of the key links. It is the only way for basic research and industrial application of large-scale integrated devices such as photonics and optoelectronics. [0003] At present, the graphene ...

Claims

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Application Information

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IPC IPC(8): H01L21/027
CPCH01L21/02236H01L29/1606B82Y40/00H10K71/621H01L21/042H01L21/3065H01L21/3081H01L21/02
Inventor 陶海华陈险峰吴艺璇苏树彬岳欢黎浩
Owner SHANGHAI JIAO TONG UNIV
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