Water containing carbonic acid and hydrogen and applications thereof on substrate surfaces

Abstract

The invention relates to water containing carbonic acid and hydrogen. The water containing carbonic acid and hydrogen is characterized in that the water containing carbonic acid and hydrogen is formedby dissolving carbon dioxide into hydrogen-containing water, the pH value of the prepared water containing carbonic acid and hydrogen is 4.0-6.8, the redox potential is -50 mv to -650 mv, and electric conductivity is 0.072-80 [mu]S / cm. Through dissolving carbon dioxide into hydrogen-containing water, the water containing carbonic acid and hydrogen, which is acidic, reductive, and high in electricconductivity, is prepared. The water containing carbonic acid and hydrogen having high reducing power can increase the micro-particle removing rate during substrate washing, and the reducing power ishigh so that oxide film formed on a substrate module is inhibited and cleaning effects are improved.

Description

technical field [0001] The invention belongs to the field of hydrogen-rich water, and relates to a circuit board cleaning technology, in particular to hydrogen carbonate gas water and its application on the surface of a substrate. Background technique [0002] In general, the substrates used to make semiconductor wafers, organic EL (OLED), photomasks, LCDs, hard disks, etc. require higher capacity and higher density. In order to prevent long-term contact with tiny modules, etc., they need to be cleaned together with dust. There are many cleaning methods for such substrates, which are roughly divided into water washing, mechanical cleaning, and dry cleaning. [0003] In the water washing method, the substrate, etc. are soaked in the chemical solution, and the pollution is removed by chemical dissolution. Mechanical cleaning is to remove particles by spraying the surface of the substrate with ice cubes, dry ice or fogger. Dry cleaning is to remove pollution by plasma dischar...

AI Technical Summary

Problems solved by technology

[0009] (2) In addition, the waste water used in the removal of chemicals contains toxins, which is not only harmful to the human body, but also requires special attention to waste water treatment;

[0010] (3) Also, after using chemicals, a large amount of water is required to remove the chemicals remaining on the substrate