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Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom

A technology of multi-layer products and block copolymers, applied in the direction of layered products, chemical instruments and methods, synthetic resin layered products, etc.

Inactive Publication Date: 2018-02-06
DOW GLOBAL TECH LLC +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This can lead to the same problems described for acid diffusion resist growth techniques

Method used

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  • Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom
  • Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom
  • Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom

Examples

Experimental program
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Effect test

example 1

[0136] This example details the synthesis of a first composition comprising a block copolymer comprising poly(N,N'-dimethylaminoethyl methacrylate)-block-poly(methacrylic acid tert-butyl ester) (PDMAEMA-b-PtBMA).

[0137] Dimethyl 2,2'-azobis(2-methylpropionate) (0.101 grams (g)), tert-butyl methacrylate (tBMA, 20.000 g), benzodithio 2-cyano A 250 milliliter (mL) glass vial was loaded with propan-2-yl ester (CPBD, 0.389 g), ethyl acetate (20 mL), and a magnetic stir bar. The mixture was deoxygenated with nitrogen for 1 hour (h) and then the flask was placed in a heat block at 70 °C for 24 hours. After the reaction, the flask was cooled by opening the bottle for 2 h and bubbling N 2 to evaporate the ethyl acetate. The reaction mixture was then dissolved in 60 mL THF and precipitated into 1 liter (L) of methanol / water mixture (9:1). The precipitate was collected and reprecipitated. The polymer poly-tert-butyl methacrylate (PtBMA) was harvested and dried overnight in a vacuu...

example 2

[0139]This example details poly(N,N'-dimethylaminoethyl methacrylate)-block-poly(adamantyl methacrylate)-block-poly(tert-butyl methacrylate) (PDMAEMA- Synthesis of b-PAdMA-b-PtBMA). Adamantyl methacrylate (AdMA) is the repeating unit used to form the neutral block. Thus, the neutral block comprises poly(1-adamantyl methacrylate). AdMA monomer was polymerized using a procedure similar to that set forth above, using PtBMA from Example 1 as the macroinitiator. Load 2.00 g of PtBMA, 13.3 g of AdMA, 0.014 g of dimethyl 2,2'-azobis(2-methylpropionate), PGMEA (15 mL), and a magnetic stir bar into a 50 mL air-free reactor . The mixture was freeze-pump-thaw three times, and then the flask was placed in a hot oil bath at 70°C for 16 hours. After the reaction, the flask was cooled, then the reaction mixture was dissolved in 10 mL of THF and precipitated into 1 L of acetonitrile. The precipitate was collected and reprecipitated. The polymer (PAdMA-b-PtBMA) was harvested and dried ov...

example 3

[0142] This example details poly(N,N'-dimethylaminoethyl methacrylate)-block-poly(adamantyl methacrylate-random-1,1-diphenylethyl methacrylate) Synthesis of (PDMAEMA-b-P(AdMA-r-PPMA)). Freeze-pump-thaw monomer and solvent three times to remove oxygen. All three monomers were activated with Al before use 2 o 3 Purified further and diluted with cyclohexane to about 50 vol% concentration. The amount of tetrahydrofuran (THF) required for a reaction concentration of about 7-10 wt% solids was transferred to the reactor containing pre-dried LiCl. The contents were cooled to -78°C in a dry ice / isopropanol bath. THF was titrated with 0.7M sec-butyllithium (SBL) initiator in cyclohexane until a green color was observed. The reaction bath was allowed to warm to room temperature until the green color completely disappeared. The reaction bath was again cooled to -78°C, followed by the addition of 0.442 g of diphenylethylene (DPE) and sec-butyllithium initiator (3.79 g, 0.43M in cyclo...

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Abstract

Disclosed herein is a multi-layered article, comprising a substrate; and two or more layers disposed over the substrate, wherein each said layer comprises a block copolymer comprising a first block and a second block, wherein the first block comprises a repeat unit containing a hydrogen acceptor or a hydrogen donor, and the second block comprises a repeat unit containing a hydrogen donor when therepeat unit of the first block contains a hydrogen acceptor, or a hydrogen acceptor when the repeat unit of the first block contains a hydrogen donor; wherein the first block of an innermost of said two or more layers is bonded to the substrate, and the first block of each layer disposed over the innermost layer is bonded to the second block of a respective underlying layer; and wherein the hydrogen donor or hydrogen acceptor of the second block of an outermost said two or more layers is blocked.

Description

Background technique [0001] The present invention relates to a method of negative tone development using a copolymer multilayer electrolyte and articles prepared therefrom. More specifically, the present invention relates to a negative tone development shrink method using a block copolymer multilayer electrolyte and articles made therefrom. [0002] In semiconductor manufacturing, photoresist materials are used to transfer images to one or more underlying layers, such as metal, semiconductor, and dielectric layers, disposed on a semiconductor substrate, as well as the substrate itself. To increase the integration density of semiconductor devices and to allow the formation of structures with dimensions in the nanometer range, photoresist and photolithographic processing tools with high resolution capabilities have been developed and continue to be developed. [0003] Positive-tone chemically amplified photoresists are routinely used for high-resolution processing using the pos...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027G03F7/30
CPCG03F7/30H01L21/0276H01L21/0273G03F7/0397G03F7/405C08F293/005G03F7/325C09D153/00B32B7/10B32B27/08B32B27/28B32B27/16G03F7/038G03F7/40H01L21/0274G03F7/165C08F293/00
Inventor P·D·休斯塔德J·朴J·张V·吉安成镇旭
Owner DOW GLOBAL TECH LLC