Semiconductor silicon abraded wafer cleaning agent and preparation method thereof
A cleaning agent, a technology of silicon grinding tablets, applied in the directions of detergent compounding agent, detergent composition, chemical instrument and method, etc., to achieve the effect of simple production process, simple operation and good commercial development prospects
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[0021] Embodiments of the present invention are described in further detail below:
[0022] A cleaning agent for semiconductor silicon grinding discs, comprising a surfactant, an organic base, a complexing agent, a cosolvent and water, the composition and content of the cleaning agent in volume percentages are as follows: 1-15% of the surfactant; 1-15% of the organic base 3-5%; complexing agent 2-10%; cosolvent 3-10%; water 60-80%;
[0023] Wherein, the surfactant is selected from sodium dodecylbenzenesulfonate, nonylphenol polyoxyethylene ether, fatty alcohol polyoxyethylene ether or a combination thereof;
[0024] The organic base is selected from one or both of the following components: triethanolamine, tetramethylammonium hydroxide;
[0025] The complexing agent is selected from one or more of the following: disodium ethylenediaminetetraacetic acid, sodium citrate and ethylenediaminetetraacetic acid;
[0026] The co-solvent is selected from glycerol, ethanol, isopropanol...
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