Complementary metal oxide semiconductor (CMOS) phase inverter and array substrate
A technology of inverters and substrates, which is applied in the direction of electric solid-state devices, semiconductor devices, transistors, etc., can solve the problems of poor stability of P-type thin film transistors and low mobility of organic semiconductor TFTs, and reduce manufacturing difficulty and production costs. performance effect
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[0031] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0032] see figure 1 , the present invention provides a CMOS inverter, comprising: a P-type low-temperature polysilicon thin film transistor 10 and an N-type metal oxide thin film transistor 20 electrically connected;
[0033] The P-type low-temperature polysilicon thin film transistor 10 and the N-type metal oxide thin film transistor 20 satisfy the following formula:
[0034]
[0035] Among them, C n and C P are the gate insulating layer capacitance of the N-type metal oxide thin film transistor 20 and the gate insulating layer capacitance of the P-type low temperature polysilicon thin film transistor 10, and are respectively the channel width-to-length ratio of the N-type metal oxide thin film transistor 20 and the channel width-to-...
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