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Composition for glass and ceramic polishing

A composition and ceramic technology, applied in polishing compositions containing abrasives, grinding machine tools, grinding devices, etc., to achieve the effects of inhibiting grinding scratches, improving optical properties, and being less prone to grinding and scratching

Inactive Publication Date: 2018-05-11
TAYCA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0018] In order to solve the above problems, the object of the present invention is to provide a composition for glass and ceramic grinding, which has good applicability to CMP grinding, does not have the possibility of deterioration or deformation because of the uniform particle size of the grinding material particles, and can It can stably exert better grinding characteristics, hardly cause grinding scratches, and obtain a good smooth surface with few surface defects, and can be applied to a wide range of grinding conditions from the acidic range to the alkaline range

Method used

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  • Composition for glass and ceramic polishing
  • Composition for glass and ceramic polishing
  • Composition for glass and ceramic polishing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0063] Redstone-type microparticle titanium dioxide coated with silicon dioxide on the surface of titanium oxide particles with an average primary particle diameter of 15 nm by chemical deposition (product name: MT-100WP manufactured by TAYCA Corporation, the ratio of titanium dioxide to titanium oxide is 43%) It was dispersed in water with a bead mill to obtain an aqueous dispersion having a solid composition concentration of 30% and a pH of 10.0. A part of this dispersion liquid was taken out and dried, and the result of surface analysis of the dried silicon oxide-coated titanium oxide particles by XPS (X-ray Photoelectron Spectroscopy) was SiO 2 / TiO 2 70 / 30.

Embodiment 2

[0065] According to the method of Japanese Patent No. 4296529, silicon dioxide is chemically deposited on the surface of titanium dioxide particles with an average primary particle diameter of 6 nm (the proportion of titanium dioxide is 15%) at 700 °C to obtain an average primary particle size of 20 nm, and dispersed in water with a bead mill to obtain an aqueous dispersion with a solid composition concentration of 30% and a pH of 2.4. A part of this dispersion liquid was taken out and dried, and the result of surface analysis of the dried silicon oxide-coated titanium dioxide particles by XPS (X-ray Photoelectron Spectroscopy) was that SiO 2 / TiO 2 for 16 / 84.

Embodiment 3

[0067] According to the method of Japanese Patent No. 4296529, anatase-type microparticle titanium dioxide (the proportion of titanium dioxide is 10% relative to titanium oxide) coated with silicon dioxide on the surface of titanium dioxide particles with an average primary particle diameter of 6 nm by chemical deposition is formed into beads. The mill was dispersed in water to obtain an aqueous dispersion having a solid composition concentration of 5% and a pH of 11.0. A part of this dispersion liquid was taken out and dried, and the result of surface analysis of the dried silicon oxide-coated titanium dioxide particles by XPS (X-ray Photoelectron Spectroscopy) was that SiO 2 / TiO 2 for 20 / 80.

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Abstract

The invention provides a composition for glass and ceramic polishing, which has excellent applicability to CMP polishing, while being composed of polishing material particles having a uniform particlesize, thereby having no concerns about the occurrence of deformation or change of properties, and which is capable of stably exhibiting excellent polishing characteristics and is not susceptible to polishing scratches, thereby enabling the achievement of a good smooth surface having less surface defects, while being capable of meeting wide polishing conditions from an acidic region to an alkalineregion. [Solution] A composition for glass and ceramic polishing, which is characterized by containing, as a polishing material, titanium oxide particles, at least a part of the surfaces of which iscovered with silicon dioxide.

Description

technical field [0001] The present invention relates to a polishing composition for polishing and smoothing the surface of components formed of glass or ceramics. Background technique [0002] In recent years, the technologies related to electromechanical devices have been significantly improved, and the high integration, miniaturization, and high-speed response of parts and components used have also been improved year by year. Along with this, the need to improve the accuracy of fine machining of parts or assemblies and the smoothness of machined surfaces has increased. For example, in a glass plate of quartz or a special composition installed in a machine as a component, when the optical characteristics such as reflectivity or transmittance of the glass itself are changed by high smoothing of a specific surface, ordinary materials such as aluminum oxide (alumina) can be used. Abrasive materials often fail to achieve the targeted optical properties. In addition, for examp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K3/14B24B37/00
CPCC09G1/02C09K3/1445B24B37/00C09G1/04C09K3/1409C09K3/1436C09K3/14
Inventor 上田真稔鹤村达也
Owner TAYCA CORP