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Colorful transparent conductive thin film as well as preparation method and application thereof

A technology of transparent conductive film and color, which is applied in the direction of equipment for manufacturing conductive/semiconductive layers, cable/conductor manufacturing, conductive layers on insulating carriers, etc., to achieve improved weather resistance, multi-color selection, and reduced types. effect

Inactive Publication Date: 2018-06-01
CSG HOLDING +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Based on this, it is necessary to provide a color transparent conductive film and its preparation method and application in order to meet the color development requirements of the colored transparent conductive film without additionally increasing the production process, process and equipment of the product.

Method used

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  • Colorful transparent conductive thin film as well as preparation method and application thereof
  • Colorful transparent conductive thin film as well as preparation method and application thereof
  • Colorful transparent conductive thin film as well as preparation method and application thereof

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preparation example Construction

[0045] The preparation method of above-mentioned colored transparent conductive film 10 comprises:

[0046] S110 , preparing an interference layer 130 on the surface of the transparent substrate 11 .

[0047] In one embodiment, the interference layer 130 is prepared on the transparent substrate 11 by magnetron sputtering. The interference layer 130 is preferably prepared by off-line PVD magnetron sputtering.

[0048] In one embodiment, the interference layer 130 is prepared by magnetron sputtering, wherein argon or an argon-oxygen mixed gas is introduced into the magnetron sputtering process. Preferably, the flow rate ratio of argon to oxygen is 100:1˜1:1:. The target-base distance is 3 cm to 15 cm, preferably 5 cm to 10 cm.

[0049] In one of the embodiments, the high refractive index layer is prepared by off-line PVD magnetron sputtering, the high refractive index layer is sputtered by direct current, the sputtering power is 2kW-30kW, preferably 5kW-20kW; the heating temp...

Embodiment 1

[0060] The high refractive index layer and the low refractive index layer of the interference layer are sequentially deposited on a 3.20mm ultra-clear transparent glass substrate. Among them, the high refractive index layer is deposited by direct current sputtering of ITO planar target, and the sputtering conditions are: argon 1000 sccm, oxygen 30 sccm, sputtering power 5 kW, target base distance 6.0 cm, ultra-white transparent glass substrate temperature 300 ℃; The refractive index layer is made of a Si rotating target, and deposited by sputtering with a 40 kHz AC power source. The sputtering conditions are: argon gas 600 sccm, oxygen gas 400 sccm, sputtering power 10 kW, target base distance 6.0 cm. Then, a conductive layer was deposited on the low refractive index layer by direct current sputtering of an ITO planar target. The sputtering conditions were: argon 1000 sccm, oxygen 30 sccm, sputtering power 5 kW, target base distance 6.0 cm, ultra-white transparent glass substra...

Embodiment 2

[0063] The low-refractive-index layer and the high-refractive-index layer of the interference layer were deposited on a 3.20 mm ultra-clear transparent glass substrate. Among them, the low refractive index layer is deposited by sputtering with Si rotating target and 40kHz AC power supply. The sputtering conditions are: argon gas 600sccm, oxygen 400sccm, sputtering power 10kW, target base distance 6.0cm. On the low-refractive-index layer, a high-refractive-index layer was deposited by direct current sputtering of an ITO planar target. The sputtering conditions are: argon gas 1000 sccm, oxygen gas 30 sccm, sputtering power 5 kW, target base distance 6.0 cm, ultra-white transparent glass substrate temperature 300°C. Then, on the low refractive index layer of the interference layer, use the ITO planar target to deposit the conductive layer by DC sputtering. The sputtering conditions are: argon 1000sccm, oxygen 30sccm, sputtering power 5kW, target base distance 6.0cm, ultra-white a...

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Abstract

The invention relates to a colorful transparent conductive thin film as well as a preparation method and application thereof. The colorful transparent conductive film comprises a transparent substrate, and interference layers and a conductive layer sequentially stacked on the transparent substrate, wherein the interference layers comprises a high-refractive-index layer and a low-refractive-index layer, the material of the high-refractive-index layer and the material of the conductive layer are selected from at least one of ITO, IXO, FTO, AZO, IZO, GZO, HAZO, SnO2, In2O3 and ZnO, and the material of the low-refractive-index layer is selected from at least one of SiO2, Al2O3, MgF2, LaF3, AlF3, YF3, BaF2 and CeF3. The conductive layer, the low-refractive-index layer and the high-refractive-index layer are alternately arranged according to the magnitude of refractive index. The colorful transparent conductive thin film can achieve three functions of color, light transmission and electric conduction at the same time. The preparation method is simple and convenient, and to no additional production procedure, process and equipment are needed.

Description

technical field [0001] The invention relates to thin films, in particular to a colored transparent conductive thin film and its preparation method and application. Background technique [0002] Transparent Conductive Oxide (TCO) is a thin film material that is both conductive and has high light transmittance in the visible range, including metal oxide films, metal films, polymer films and other composite films Wait. On the one hand, colored transparent conductive films can be used as key materials for optoelectronic devices in the fields of flat panel displays, touch screens, and thin-film solar cells. On the other hand, the colored transparent conductive film can also be applied to low-emissivity glass, electrochromic glass, electric heating glass, defogging and defrosting glass, anti-electromagnetic interference transparent window, antistatic coating, etc. [0003] Deposit a certain thickness of TCO film on a transparent substrate, and the light interference effect makes...

Claims

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Application Information

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IPC IPC(8): H01B5/14H01B13/00G02F1/153
CPCH01B5/14G02F1/153H01B13/00H01B13/0026
Inventor 宋秋明洪尚坤刘莹吕宜超崔平生王琦
Owner CSG HOLDING
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