A preparation method of zinc oxide@zinc microspheres
A technology of zinc oxide and microspheres, applied in the direction of nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, can solve high-demand problems, achieve the effect of avoiding direct action, eliminating the preparation process, and being easy to control
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[0023] A method for preparing zinc oxide@zinc microspheres of the present invention uses a pulsed laser deposition system to prepare zinc oxide@zinc microspheres in one step through laser ablation technology. Such as figure 1 , the pulsed laser deposition system includes a pulsed laser 1, a lens 2, a metal zinc target 3, a stage 4 and a substrate 5, the target is directly ablated by laser in the air, and the metal target is ablated due to the high energy of the laser , will generate metal plasma, and then agglomerate and oxidize in the liquid environment on the substrate, and finally form zinc oxide@zinc composite microspheres on the substrate.
[0024] The prepared zinc oxide@zinc microspheres are composite microspheres with a core-shell structure in which zinc oxide microsphere shells wrap zinc particles, and have a spherical shape with a smooth surface; The spherical shell walls have nanometer dimensions.
Embodiment 1
[0026] Turn on the pulse laser 1, adjust the position of the lens 2, and focus the laser beam on the surface of the zinc target 3; then place the substrate silicon wafer at a position 5 mm away from the target in the horizontal direction and 1 cm away from the laser focus point in the longitudinal direction. Drop a few drops of deionized water on the wafer until the substrate is evenly covered; adjust the laser output power to 150mW, and the ablation time to 2min; place the silicon wafer at 60°C to dry, as figure 2 , ZnO@Zn composite microspheres were grown on the silicon wafer, but due to the low laser output power, the morphology of ZnO@Zn microspheres was irregular, and no smooth and regular composite particles were formed.
Embodiment 2
[0028] Turn on the pulse laser 1, adjust the position of the lens 2, and focus the laser beam on the surface of the zinc target 3; then place the substrate silicon wafer at a position 5 mm away from the target in the horizontal direction and 1 cm away from the laser focus point in the longitudinal direction. Add a few drops of deionized water on the wafer until the substrate is covered; adjust the laser output power to 210mW, and ablation time to 5min; dry the silicon wafer at 60°C to obtain zinc oxide@zinc microspheres. structured as image 3 , it can be seen that the zinc oxide@zinc microspheres are hollow core-shell composite microspheres in which zinc oxide microsphere shells wrap zinc particles, and have a spherical shape with a smooth surface and a diameter of about 3 μm.
[0029] The laser performance of the prepared zinc oxide@zinc microspheres was tested, and the obtained laser spectrum was as follows: Figure 4 , it can be seen that the ZnO@Zn microspheres have obvi...
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