Production method for wiring substrate
A technology for wiring substrates and manufacturing methods, applied in the directions of printed circuit manufacturing, circuit substrate materials, chemical instruments and methods, etc., can solve the problems of decreased flexibility and unsuitability of wiring substrates, and achieves suppression of warpage and conduction. bad effect
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no. 1 approach
[0176] In the case of manufacturing the wiring board 1 by the method (i), using Figure 1A Shown is a laminate 1A of the layer structure of first conductor layer 12 / electrical insulator layer 10 / second conductor layer 14 . The electrical insulator layer 10 has a layer structure of layer (A) 16 / layer (B) 18 / layer (A) 16 . Such as Figure 1B As shown, in the laminated body 1A, a hole 20 penetrating from the first conductor layer 12 to the second conductor layer 14 is formed by a drill, a laser, or the like. Next, under the condition of not performing etching treatment using metallic sodium, after performing either or both of permanganate solution treatment and plasma treatment on the inner wall surface 20a of the formed hole 20, as Figure 1C As shown, electroless plating or the like is performed on the inner wall surface 20 a of the hole 20 to form a plated layer 22 .
no. 2 approach
[0178] In the case of manufacturing the wiring board 2 by the method (i), using Figure 2A Shown is a laminate 2A of the layer structure of first conductor layer 12 / electrical insulator layer 10A / second conductor layer 14 . The electrical insulator layer 10A has a layer structure consisting of layer (A) 16 / layer (B) 18 . Same as the case of wiring board 1, such as Figure 2B As shown, a hole 20 penetrating from the first conductor layer 12 to the second conductor layer 14 is formed in the laminated body 2A. Next, under the condition of not performing etching treatment using metallic sodium, after performing either or both of permanganate solution treatment and plasma treatment on the inner wall surface 20a of the formed hole 20, as Figure 2C As shown, the plating layer 22 is formed on the inner wall surface 20 a of the hole 20 .
no. 3 approach
[0180] In the case of manufacturing the wiring board 3 by the method (i), using Figure 3A Shown is a laminate 3A of the layer structure of first conductor layer 12 / electrical insulator layer 10B / second conductor layer 14 . The electrical insulator layer 10 has a layer structure of layer (B) 18 / layer (A) 16 / layer (B) 18 . Same as the case of wiring board 1, such as Figure 3B As shown, a hole 20 penetrating from the first conductor layer 12 to the second conductor layer 14 is formed in the laminated body 3A. Next, under the condition of not performing etching treatment using metallic sodium, after performing either or both of permanganate solution treatment and plasma treatment on the inner wall surface 20a of the formed hole 20, as Figure 3C As shown, electroless plating or the like is performed on the inner wall surface 20 a of the hole 20 to form a plated layer 22 .
[0181] (method (ii))
[0182] Method (ii) has the following steps.
[0183] (ii-1) A step of formi...
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Abstract
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