Preparation method for copper-doped multilayer graphene
A multi-layer graphene, copper-doped technology, applied in the field of graphene, can solve the problems of unfavorable large-scale production and high price of doped graphene, and achieve the effects of being smooth and uniform, low in cost, and easy to obtain
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[0022] Embodiment 1: A preparation method of copper-doped multilayer graphene, using graphite target material and copper target material as raw materials, adopting DC and RF co-sputtering in magnetron sputtering, introducing copper element into carbon matrix, making The structure and energy level of multilayer graphene are effectively improved, and the specific steps are as follows:
[0023] 1) Copper targets are placed on the RF, and graphite targets are placed on the DC;
[0024] 2) Pump the vacuum pressure of the cavity to 10 -3 Below Pa, argon gas is introduced, and the pressure of argon is 10~0.1Pa;
[0025] 3) Adjust the radio frequency power to 20W~30W, the DC power to 100W~150W, and sputter together for 30min to obtain thin-film copper-doped multilayer graphene.
[0026]
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