Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method for copper-doped multilayer graphene

A multi-layer graphene, copper-doped technology, applied in the field of graphene, can solve the problems of unfavorable large-scale production and high price of doped graphene, and achieve the effects of being smooth and uniform, low in cost, and easy to obtain

Active Publication Date: 2018-07-06
KUNMING INST OF PHYSICS
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] What the present invention is to solve is the problem that the existing doped graphene is expensive and unfavorable for large-scale production. It provides a method of effectively modulating the structure and energy level of multilayer graphene through the doping of heterogeneous copper atoms, thereby Preparation method of copper-doped multilayer graphene for improving photoelectric properties of multilayer graphene

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for copper-doped multilayer graphene
  • Preparation method for copper-doped multilayer graphene
  • Preparation method for copper-doped multilayer graphene

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Embodiment 1: A preparation method of copper-doped multilayer graphene, using graphite target material and copper target material as raw materials, adopting DC and RF co-sputtering in magnetron sputtering, introducing copper element into carbon matrix, making The structure and energy level of multilayer graphene are effectively improved, and the specific steps are as follows:

[0023] 1) Copper targets are placed on the RF, and graphite targets are placed on the DC;

[0024] 2) Pump the vacuum pressure of the cavity to 10 -3 Below Pa, argon gas is introduced, and the pressure of argon is 10~0.1Pa;

[0025] 3) Adjust the radio frequency power to 20W~30W, the DC power to 100W~150W, and sputter together for 30min to obtain thin-film copper-doped multilayer graphene.

[0026]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a preparation method for copper-doped multilayer graphene, and relates to graphene. According to the preparation method for copper-doped multilayer graphene, through doping ofheterogeneous copper atoms, the structure and the energy stage of the multilayer graphene are effectively regulated, and the photoelectric property of the multilayer graphene is improved. According to the preparation method, a graphite target material and a copper target material are used as raw materials, direct current radio frequency joint sputtering of magnetron sputtering is adopted, a copper element is led into a carbon substrate, and the structure and the energy stage of the multilayer graphene are effectively improved. According to the preparation method, low-cost easily-obtained andnontoxic graphite target material and copper target material are used as the raw materials, the copper element is led into the carbon substrate, the structure and the energy stage of the multilayer graphene are effectively improved, and the electron transition mode is more diverse; and the photoelectric property of the multilayer graphene is effectively changed, and the multilayer graphene can beused for detectors, light emitting diodes, solar batteries, supercapacitors, lithium ion batteries, fluorescent materials and other fields.

Description

technical field [0001] The invention relates to graphene, especially a preparation of copper-doped multilayer graphene that effectively modulates the structure and energy level of multilayer graphene by doping heterogeneous copper atoms, thereby improving the photoelectric properties of multilayer graphene method. Background technique [0002] In recent years, with the continuous advancement of science and technology, countries around the world have continuously improved the performance requirements of detectors, and are increasingly inclined to miniaturization and high-performance devices. This puts forward high requirements on the flatness and uniformity of the carbon film. It is difficult for single-layer graphene to meet this requirement in industry. Many researchers turn to the research of multi-layer graphene, which is not only smooth and uniform. Very good, and retains many properties of graphene. Magnetron sputtering is a very good method for preparing thin films. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0605C23C14/352
Inventor 唐利斌姬荣斌项金钟高树雄袁绶章魏虹铁筱滢李雄军左大凡王燕林占文韩福忠
Owner KUNMING INST OF PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products