Measurement method of common optical path self-calibration film thickness and refractive index to eliminate transmitted light
A technology of film thickness and measurement method, which is applied in the field of optical measurement, can solve problems such as the inability to eliminate the influence of laser transmitted light, the destruction of film surface morphology, and the cracking of laser interference signals, so as to eliminate the influence of interference signal quality, reduce the difficulty of identification, and reduce the effect of complexity
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[0053] devices used such as Figure 9 As shown, the light source output module 1 is composed of a wide-spectrum light source 101 with a center wavelength of 1310nm, a narrow-band frequency-stabilized laser light source 103 with a wavelength of 1550nm, a first isolator 102 with a working wavelength of 1310nm, a second isolator 104 with a working wavelength of 1550nm, and The working wavelength is 1310nm and 1550nm and the first wavelength division multiplexer 105 is composed together. Among them, the output light of the wide-spectrum light source 101 with a center wavelength of 1310nm is used as the measurement beam, mainly used to realize the absolute measurement of the film thickness; the output light of the narrow-band frequency-stabilized laser light source 103 with a wavelength of 1550nm is used as the optical path correction beam, mainly used to realize the film thickness. Traceability of measurements. The feature of the film thickness measuring probe module 4 is: the fi...
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