Unlock instant, AI-driven research and patent intelligence for your innovation.

Preparation method of high-sensitivity rapid analysis surface enhanced Raman scattering substrate

A surface-enhanced Raman, rapid analysis technology, applied in Raman scattering, material analysis, material excitation analysis, etc., can solve problems such as restricting the application of Raman detection, long detection time, inability to detect in real time, etc. High sensitivity, high sensitivity effect

Inactive Publication Date: 2018-07-24
INT ACAD OF OPTOELECTRONICS AT ZHAOQING SOUTH CHINA NORMAL UNIV
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This process results in long detection times and prevents real-time detection in solution, surface-enhanced Raman scattering substrates for rapid analysis
[0006] At present, there is a lack of a Raman substrate that can be prepared and detected easily and quickly, and can realize real-time detection and rapid analysis, which seriously restricts the practical application of Raman detection.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of high-sensitivity rapid analysis surface enhanced Raman scattering substrate
  • Preparation method of high-sensitivity rapid analysis surface enhanced Raman scattering substrate
  • Preparation method of high-sensitivity rapid analysis surface enhanced Raman scattering substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] A method for preparing a surface-enhanced Raman scattering substrate with high sensitivity and fast analysis, comprising the following steps:

[0035] S1 prepares a mixed solution of 3M hydrofluoric acid, 0.06M silver nitrate and 0.01M CTAB;

[0036] S2 dripping the mixed solution prepared in step S1 on the surface of the silicon wafer;

[0037] S3 was reacted for 5 minutes, the silicon wafer was rinsed and dried with nitrogen gas.

[0038] Soak the high-sensitivity surface-enhanced Raman scattering substrate prepared according to the above steps in the rhodamine 6G to be detected for real-time detection. The laser wavelength used is 532nm, the power is 0.14mw, the integration time is 0.1s, and the accumulation times are 10 Second-rate.

[0039] The results show that the SEM images of the prepared surface-enhanced Raman scattering substrate are as follows: figure 1 As shown, detect rhodamine 6G (5×10 -14 The Raman spectrum of M) is as follows figure 2 As shown, in...

Embodiment 2

[0041] A method for preparing a surface-enhanced Raman scattering substrate with high sensitivity and fast analysis, comprising the following steps:

[0042] S1. prepare 3M hydrofluoric acid, the mixed solution of 0.06M silver nitrate and 0.005M CTAB;

[0043] S2. Adding the mixed solution prepared in step S1 dropwise on the surface of the silicon wafer;

[0044] S3. After reacting for 5 minutes, the silicon wafer was rinsed and dried with nitrogen gas.

[0045] The highly sensitive surface-enhanced Raman scattering substrate prepared according to the above steps was soaked in rhodamine 6G (5×10 -10 In M), real-time detection is carried out, the laser wavelength used is 532nm, the power is 0.14mw, the integration time is 0.1s, and the number of accumulations is 10 times to obtain a Raman spectrogram, which has a strong Raman signal.

Embodiment 3

[0047] A method for preparing a surface-enhanced Raman scattering substrate with high sensitivity and fast analysis, comprising the following steps:

[0048] S1. Prepare 3M hydrofluoric acid, 0.06M silver nitrate and 5×10 -5 Mixed solution of M CTAB;

[0049] S2. Adding the mixed solution prepared in step S1 dropwise on the surface of the silicon wafer;

[0050] S3. After reacting for 5 minutes, the silicon wafer was rinsed and dried with nitrogen gas.

[0051] The highly sensitive surface-enhanced Raman scattering substrate prepared according to the above steps was soaked in rhodamine 6G (5×10 -7In M), real-time detection is carried out, the laser wavelength used is 532nm, the power is 0.14mw, the integration time is 0.1s, and the number of accumulations is 10 times to obtain a Raman spectrogram, which has a strong Raman signal.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Sensitivityaaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method of a high-sensitivity rapid analysis surface enhanced Raman scattering substrate. The reparation method comprises the following steps: preparing a mixed solution of hydrofluoric acid, silver nitrate and CTAB (cetyltrimethyl ammonium bromide); adding the mixed solution to the surface of a silicon wafer; washing the silicon wafer clean with deionized water after finishing a reaction, and drying by blowing with nitrogen, wherein the concentration of the hydrofluoric acid is 10<-3>-10 M, the concentration of the silver nitrate is 10<-4>-1 M, and the concentration of the CATB is 10<-6>-1 M. Compared with the prior art, the preparation method has the following advantages: (1) the simple redox reaction is used, the preparation process is simple and convenient, and the cost is low; (2) the repeatability of the prepared substrate is good; (3) the sensitivity is high, and the detection limit reaches 10<-14> M when a rhodamine 6G molecule is taken as the probe; (4) the detection can be conducted in the solution in real time, the analysis is fast, and compared with the commonly used dry method dipping and adsorption requiring one hour or even longer, the detection speed is high.

Description

technical field [0001] The invention relates to the technical field of Raman detection, in particular to a method for preparing a surface-enhanced Raman scattering substrate for high-sensitivity and rapid analysis. Background technique [0002] Raman spectrum is a kind of scattering spectrum. Raman spectroscopy is based on the Raman scattering effect discovered by Indian scientist C.V. Raman (Raman). It analyzes the scattering spectrum different from the frequency of the incident light to obtain molecular vibration and rotation information, and is applied to the study of molecular structure. a method of analysis. In 1974, surface-enhanced Raman scattering was discovered for the first time. However, due to the backwardness of laser technology, the field of surface-enhanced Raman scattering has been slow to develop. In recent years, due to the development of laser and spectroscopic technology, surface-enhanced Raman spectroscopy has received more and more attention as an im...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65G01N21/01
CPCG01N21/01G01N21/658
Inventor 金名亮卢涵水玲玲周国富
Owner INT ACAD OF OPTOELECTRONICS AT ZHAOQING SOUTH CHINA NORMAL UNIV