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Preparation method of dynamic photonic crystal pattern for controlling film refractive index in wetting manner

A photonic crystal, colloidal photonic crystal technology, applied in optics, optical components, components for opto-mechanical processing, etc., can solve problems such as environmental restrictions, cumbersome experimental procedures, expensive electromagnetic equipment, etc. The effect of easy control of conditions and simple process

Active Publication Date: 2018-09-14
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The patent application number is CN201610074370.9. The prepared structural color pattern can change color under the action of an external magnetic field, and the color has an angle dependence. After removing the external magnetic field, the pattern color disappears. The anti-counterfeiting pattern is not easy to imitate. The process is cumbersome, not only the electromagnetic equipment is expensive but also restricted by the environment

Method used

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  • Preparation method of dynamic photonic crystal pattern for controlling film refractive index in wetting manner
  • Preparation method of dynamic photonic crystal pattern for controlling film refractive index in wetting manner
  • Preparation method of dynamic photonic crystal pattern for controlling film refractive index in wetting manner

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0065] Example 1 A method for preparing a dynamic photonic crystal pattern that controls the refractive index of a thin film by wetting

[0066] 1. Preparation of colloidal photonic crystal composite film

[0067] (1) Lay it horizontally on a clean ordinary glass sheet substrate, then insert another glass sheet containing colloidal microspheres into the water at an angle of 45° and fix it, and squeeze out the monodisperse polystyrene colloidal microsphere solution with a needle , when the microsphere solution evenly covered the entire water surface, let it stand still for 5 minutes, quickly blot the water dry with a sponge on the edge of the water, first air-dried for 4 hours, and then dried it in an oven at 65°C for 2 hours to obtain the arrangement Regular two-dimensional photonic crystal;

[0068] (2) Measure 100 μL of hydroxyethyl acrylate, 100 μL of glycidyl methacrylate, 200 μL of stearyl acrylate, 550 μL of polyethylene glycol diacrylate, and 0.03 g of benzophenone (eq...

Embodiment 2

[0071] Example 2 A method for preparing a dynamic photonic crystal pattern that controls the refractive index of a thin film by wetting

[0072] 1. Preparation of colloidal photonic crystal composite film

[0073] (1) Lay it horizontally on the polypropylene substrate, then insert the glass sheet loaded with colloidal microspheres into the water at an angle of 45° and fix it, squeeze out the monodisperse silica colloidal microsphere solution with a needle, when the microsphere solution is uniform After the floor covers the entire water surface, stand still for 10 minutes, and quickly absorb the water with a sponge on the edge of the water (such as figure 1 Shown), air-dried for 2 hours first, and then dried in an oven at 80 °C for 5 hours to obtain a well-arranged two-dimensional photonic crystal;

[0074] SEM characterization of two-dimensional photonic crystals ( figure 2 ). The results show that this method can be self-assembled on the plastic polypropylene (PP) film, a...

Embodiment 3

[0078] Example 3 A method for preparing a dynamic photonic crystal pattern that controls the refractive index of a thin film by wetting

[0079] 1. Preparation of colloidal photonic crystal composite film

[0080] (1) Lay it horizontally on a clean quartz sheet, then insert the glass sheet loaded with colloidal microspheres into the water at an angle of 45° and fix it, squeeze out the monodisperse polymethyl methacrylate colloidal microsphere solution with a needle, when the microspheres After the ball solution evenly covered the entire water surface, let it stand still for 3 minutes, blot the water quickly with a sponge on the edge of the water, first air-dry it for 1 hour, and then dry it in an oven at 50 °C for 8 hours to obtain the neatly arranged two dimensional photonic crystal;

[0081] (2) Measure 100 μL of hydroxyethyl acrylate, 100 μL of methyl methacrylate, 200 μL of cetyl methacrylate, 500 μL of polyethylene glycol diacrylate, and 0.01 g of 2-methylbenzophenone (...

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Abstract

The invention provides a preparation method of a dynamic photonic crystal pattern for controlling a film refractive index in a wetting manner. The preparation method comprises the following steps: firstly preparing a two-dimensional photonic crystal on a transparent base material; then uniformly mixing acrylic monomers, a light sensitive agent and a cross-linking agent, obtaining a mixed solution,enabling the two-dimensional photonic crystal to contact a mixed solution, covering the transparent base material with a mask plate with patterns, curing under the ultraviolet rays, stripping a film,and obtaining a colloid photon crystal composite film which is controlled to be patterned in the wetting manner; and placing the composite film in a responsive solvent, or spraying the responsive solvent onto the composite film, and obtaining the dynamic photon crystal pattern. The polymerization degree of the reaction monomers is controlled by virtue of the mask plate, so that the wetting performance of different areas can be controlled, the refractive index of different areas can be controlled, a high bragg diffraction light appears in the film sheltered area, and the pattern is displayed in the area. The method is simple in process, the reaction condition is easy to control, and the patterning response is rapid.

Description

technical field [0001] The invention belongs to the technical field of polymer materials. In particular, it relates to a method for controlling the refractive index of a thin film by wetting through the degree of polymerization reaction, and more specifically, relates to a method for preparing a dynamic photonic crystal pattern for controlling the refractive index of a thin film by wetting. Background technique [0002] Material surface patterning technology refers to the technology of constructing micro-nano structures on the surface of materials, so as to regulate the relevant characteristics of the material surface. It has brought new development space and opportunities to the field of modern science and technology. It has important application prospects in sensing detection, photonic ink, display, anti-counterfeiting, etc. [0003] The ability to change the photonic bandgap of the patterned region with external stimuli is called responsive photonic crystal patterning. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/76G02B1/00C08F283/06C08F283/00C08F220/20C08F220/32C08F220/14C08F220/18
CPCG03F1/76G02B1/005C08F220/14C08F220/20C08F220/32C08F283/008C08F283/065C08F220/325C08F220/1818C08F220/1804
Inventor 刘海露洪炜陈旭东
Owner SUN YAT SEN UNIV
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