Conductive slurry for semiconductor packaging and preparation method thereof
A conductive paste, semiconductor technology, applied in conductive materials dispersed in non-conductive inorganic materials, semiconductor devices, cable/conductor manufacturing, etc. Achieve the effect of improving antioxidant capacity, solving the decline of electrical conductivity, preventing agglomeration and oxidation
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[0040] The present invention also provides a method for preparing conductive paste for semiconductor packaging, comprising the following steps:
[0041] a) In the mixed solution of protonic acid and dopant, after stirring and adding nano metal particles, then adding conductive polymer monomer, to obtain a conductive polymer in-situ polymerization reaction solution containing nano metal particles;
[0042] b) conducting in-situ polymerization reaction of the conductive polymer containing nano-metal particles under stirring to obtain a dispersion solution containing nano-metal covered by the conductive polymer;
[0043] c) drying the dispersion solution containing the nano metal covered by the conductive polymer to obtain the nano metal covered by the conductive polymer;
[0044] d) After mixing the solvent, the dispersant and the viscosity regulator, stirring and adding the nano-metal coated with the conductive polymer for dispersion to obtain the conductive paste.
[0045] In...
Embodiment 1
[0076] Add 20g of copper powder with an average diameter of 100nm into 100ml of dilute sulfuric acid with a mass fraction of 5%, and react for 5min under 1000rpm magnetic stirring at 25°C to obtain a dilute sulfuric acid solution containing nano-copper particles;
[0077] At 25°C, use deionized water to wash the dilute sulfuric acid solution containing the nano-copper particles for 3 times to obtain the nano-copper particles after cleaning with deionized water;
[0078] In addition, 0.06mol sodium persulfate is added to the reaction vessel, then dilute sulfuric acid and water are added into the reaction vessel, so that the concentration of the dilute sulfuric acid in the reaction vessel is 0.05M, and the concentration of sodium persulfate is 0.05M;
[0079] Under 1200rpm magnetic stirring, add nano-copper particles washed with deionized water to the reaction vessel, and then add aniline to the reaction vessel to obtain a conductive polymer in-situ polymerization reaction soluti...
Embodiment 2
[0085] Add 20g of copper powder with an average diameter of 100nm into 100ml of dilute sulfuric acid with a mass fraction of 5%, and react for 5min under 1000rpm magnetic stirring at 25°C to obtain a dilute sulfuric acid solution containing nano-copper particles;
[0086] At 25°C, use deionized water to wash the dilute sulfuric acid solution containing the nano-copper particles for 3 times to obtain the nano-copper particles after cleaning with deionized water;
[0087] In addition, 0.06mol sodium persulfate is added to the reaction vessel, then dilute sulfuric acid and water are added into the reaction vessel, so that the concentration of the dilute sulfuric acid in the reaction vessel is 0.05M, and the concentration of sodium persulfate is 0.05M;
[0088] Under 1200rpm magnetic stirring, add nano-copper particles washed with deionized water to the reaction vessel, and then add aniline to the reaction vessel to obtain a conductive polymer in-situ polymerization reaction soluti...
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