Super-hydrophobic film with singular microstructure, and preparation method thereof

A microstructure and super-hydrophobic technology, applied in the direction of microstructure technology, microstructure devices, manufacturing microstructure devices, etc., can solve the problems of high cost and complicated process, and achieve the effect of low cost, simple process and simple preparation method

Active Publication Date: 2018-09-18
陕西竞宇智能装备发展有限公司
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing superhydrophobic film preparation methods mainly include sol-gel method, chemical vapor deposition method, etching method, anodic oxidation method, etc. The common disadvantages of these methods are that the process is complicated, the cost is high, and expensive low surface energy materials are required. materials, and the preparation process of some processes requires the use of toxic benzene series, which cannot be applied on a large scale in engineering

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Super-hydrophobic film with singular microstructure, and preparation method thereof
  • Super-hydrophobic film with singular microstructure, and preparation method thereof
  • Super-hydrophobic film with singular microstructure, and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0038] refer to Figure 1 to Figure 8 , a method for preparing a superhydrophobic film with a singular microstructure of the present invention, comprising the following steps:

[0039] (1) Preparation and processing of the metal through-hole template: the required circular through-hole microarray pattern structure is processed on the 304 stainless steel with a thickness of 30-50 μm by exposure etching process, and the diameter of the through-hole of the metal template is 50-80 μm. The spacing between the microholes is 50-80μm, and the surface of the metal through-hole template is modified by perfluorosilane to reduce its surface energy;

[0040] (2) Selection of upper and lower electrodes and polymer materials: the upper and lower electrodes are made of flat plates with excellent conductivity, ITO glass or highly doped conductive silicon wafers can be used, and the polymer is made of thermosetting polymer polydimethylsiloxane ( PDMS);

[0041] (3) Polymer preforming: Spin-co...

Embodiment 1

[0046] A method for preparing a superhydrophobic film with a singular microstructure based on electric field induction of the present invention, comprising:

[0047] (1) Preparation and processing of metal through-hole template: refer to figure 1 and figure 2 , the metal via hole template 1 adopts the exposure etching process to prepare a microstructure array with through holes on the surface, the thickness h1 of the metal via hole template is 30 μm, the through hole W2 of the microstructure array is 50 μm, and the spacing W1 between the microholes is 50 μm , the surface of the through-metal template is modified by heptadecafluorodecyltriethoxysilane, that is, a self-assembled monomolecular fluorine-silicon film layer is formed on the surface of the through-metal template, so that the treated through-metal template 1 The surface has an extremely low surface energy, which prevents the polymer from sticking to the surface during the final detachment process.

[0048] (2) Select...

Embodiment 2

[0054] A method for preparing a superhydrophobic film with a singular microstructure based on electric field induction of the present invention, comprising:

[0055] (1) Preparation and processing of metal through-hole template: refer to figure 1 and figure 2 , the metal through-hole template 1 adopts the exposure etching process to prepare a microstructure array with through holes on the surface, the thickness h1 of the metal through-hole template is 40 μm, the through hole W2 of the microstructure array is 60 μm, and the spacing W1 between the microholes is 70 μm , the surface of the through-metal template is modified by perfluorosilane, that is, a self-assembled monomolecular fluorine-silicon film layer is formed on the surface of the through-metal template, so that the surface of the through-metal template 1 after treatment has an extremely low surface area. Yes, it prevents the polymer from sticking to its surface during final release.

[0056] (2) Selection of upper a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
contact angleaaaaaaaaaa
angleaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a super-hydrophobic film with a singular microstructure, and a preparation method thereof. The preparation method comprises the following steps: processing a through hole microarray pattern structure on a metal plate; spin coating a layer of thermosetting polymer polydimethylsiloxane on a lower electrode plate; placing a metal through hole template above the polymer coatingand forming a micro-contact; forming a pair of planar electrodes by using an upper electrode plate and the lower electrode plate, reserving a preset air gap between the upper electrode plate and themetal through hole template, and filling and maintaining a high-voltage power supply into the upper electrode plate and the lower electrode plate, so that the electric field force applied to the polymer is greater than the own surface tension until the polymer forming is ended; and curing the formed polymer to obtain the super-hydrophobic film with the singular microstructure. The preparation method provided by the invention is a preparation method based on electric field induction, thus requiring no expensive low surface energy material, and having simple process and relatively low cost; andno toxic benzene series is used in the preparation process, which is beneficial to large-scale application in engineering.

Description

technical field [0001] The invention belongs to the technical field of super-hydrophobic films, in particular to a super-hydrophobic film with a singular microstructure and a preparation method thereof. Background technique [0002] Superhydrophobic materials have broad application prospects in self-cleaning, anti-icing, and fluid drag reduction. Two factors are mainly considered in the construction of superhydrophobic surfaces: one is that the material has low surface energy, and the other is to increase the surface roughness. The existing superhydrophobic film preparation methods mainly include sol-gel method, chemical vapor deposition method, etching method, anodic oxidation method, etc. The disadvantages of these methods are that the process is complicated, the cost is high, and expensive low surface energy materials are required. materials, and the preparation process of some processes requires the use of toxic benzene series, which cannot be applied on a large scale in...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
CPCB81C1/00158B81C1/00349
Inventor 蔡安江周嘉玮叶向东张学锋
Owner 陕西竞宇智能装备发展有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products