Back surface field gasb thermal photovoltaic cell and preparation method thereof
A technology of thermal photovoltaic cells and back surface field, applied in photovoltaic power generation, circuits, electrical components, etc., can solve the problem of low conversion efficiency of thermal photovoltaic cells
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[0024] see figure 1 As shown, the present invention provides a back surface field GaSb thermal photovoltaic cell, comprising:
[0025] A substrate 3, the substrate 3 is a single wafer obtained by cutting and polishing a Te-doped n-type GaSb single crystal grown by the liquid seal Czochralski method (LEC), and the donor Te doping concentration is 5×10 16 -8×10 16 cm -3 , the crystal orientation is 2° from the (100) direction to the (110) direction, the thickness is 500 μm, and the size is 1×1cm 2 ;
[0026] An active region 4, which is made on the substrate 3, the material of the active region 4 is Zn-diffused p-type GaSb, the diffusion depth is 300-800nm, and the doping concentration is 5×10 18 -5×10 19 cm -3 ;
[0027] A back electric field layer 2, which is made on the back of the substrate 3, the material of the back electric field layer 2 is Te ion-implanted n+ type GaSb, the implantation depth is 50-75nm, and the doping concentration is 1×10 18 -1×10 19 cm -3 ; ...
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