Intelligent thermal control device and preparation method thereof
A technology of thermal control and devices, which is applied in the field of spacecraft thermal control, can solve the problems of loss of intelligent adjustment ability due to temperature changes of spacecraft components, reduction of solar absorption rate, difficulty in meeting spacecraft and other problems, to ensure intelligent adjustment ability and control effect Good, wide range of emissivity variations
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Embodiment 1
[0034] A kind of intelligent thermal control device of the present invention, its structural diagram is as follows figure 1 As shown, it is a four-layer composite structure, and the composite structure is covered on a silicon substrate. The composite structure is a reflective layer 1 (a gold film with a thickness of 300nm), a dielectric layer 2 (a magnesium fluoride film with a thickness of 1000nm) from bottom to top. ), a phase change layer 3 (a vanadium dioxide film with a thickness of 30 nm) and an absorptivity control layer 4 (a nano-polyethylene film doped with magnesium oxide particles with a thickness of 5 μm).
[0035] The preparation method of the intelligent thermal control device of this embodiment includes the following steps:
[0036] (1) adopt electron beam evaporation method to prepare the gold thin film that thickness is 300nm on silicon substrate;
[0037] (2) adopt electron beam evaporation method to prepare the magnesium fluoride thin film that thickness is...
Embodiment 2
[0042] A kind of intelligent thermal control device of the present invention, such as figure 1 As shown, it is a four-layer composite structure, the composite structure is covered on the silicon substrate, and the composite structure from bottom to top is the reflective layer 1 (aluminum film with a thickness of 100nm), the dielectric layer 2 (a zinc sulfide film with a thickness of 680nm), and the corresponding The variable layer 3 (a vanadium dioxide film with a thickness of 60 nm) and the absorption control layer 4 (a fluorocarbon resin film doped with titanium oxide particles with a thickness of 1 μm).
[0043] The preparation method of the intelligent thermal control device of this embodiment includes the following steps:
[0044] (1) Prepare a 100nm aluminum film with a thickness of 100nm on a silicon substrate by magnetron sputtering;
[0045] (2) Prepare a zinc sulfide dielectric layer with a thickness of 680nm on the aluminum film prepared in step (1) by electron bea...
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