Method for preparing hollow microneedle array
A microneedle array and hollow technology, which is applied in the field of micromachining, can solve the problems of complex preparation process, high cost and poor structure controllability of the hollow microneedle array, and achieves the effects of high cost, simple operation and uniform material.
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[0030] Examples 1-7
[0031] In summary, Examples 1-7 all include the following steps:
[0032] 1. Preparation of PMMA microneedle array negative template: adjust the processing parameters of the laser engraving machine (as shown in Table 1), so that the laser will etch microneedle holes of different sizes on the PMMA substrate;
[0033] 2. Preparation of the positive template for the PDMS microneedle array: mix PDMS (Sylgard 184) and the curing agent at a mass ratio of 10:1, and let it stand for a period of time to remove the bubbles in the mixture. After the bubbles are removed, add the above-mentioned PMMA microneedle array negative Vacuum the surface of the template for several minutes to allow PDMS to enter and fill the holes to obtain the positive template of the PDMS microneedle array with the same size as the negative template of the PMMA microneedle array;
[0034] 3. Use the silver mirror reaction to plate a silver seed layer on the surface of the PDMS microneedle array posi...
Example
[0041] Examples 8-13
[0042] In summary, Examples 8-13 all include the following steps:
[0043] 1. Preparation of PDMS substrate: Mix PDMS (Sylgard 184) and curing agent at a mass ratio of 10:1, let stand for a period of time to remove bubbles in the mixture, and then heat at 100°C for 1 hour to make it completely solidified. Obtain the PDMS substrate;
[0044] 2. Preparation of the negative template of the PDMS microneedle array: adjust the processing parameters of the laser engraving machine to a laser power of 100W, a laser scanning speed of 10 mm / s, and a frequency of 1 time, so that the length of the laser etching on the PDMS substrate is approximately 2000μm microneedle array negative template;
[0045] 3. Preparation of polymethyl methacrylate (PMMA) microneedle array positive template: Place the PMMA plate on the surface of the above-mentioned PDMS microneedle array negative template with engraved holes, heat and vacuum, so that PMMA enters and fills the holes. Obtain the ...
Example Embodiment
[0053] Example 14
[0054] This embodiment includes the following steps:
[0055] 1. Preparation of PDMS substrate: Mix PDMS (Sylgard 184) and curing agent at a mass ratio of 10:1, let stand for a period of time to remove bubbles in the mixture, and then heat at 100°C for 1 hour to make it completely solidified. Obtain the PDMS substrate;
[0056] 2. Preparation of the negative template of the PDMS microneedle array: adjust the processing parameters of the laser engraving machine to a laser power of 100W, a laser scanning speed of 10 mm / s, and a frequency of 1 time, so that the length of the laser etching on the PDMS substrate is approximately 2000μm microneedle array negative template;
[0057] 3. Preparation of polypropylene microneedle array positive template: Place the polypropylene plate on the surface of the above-mentioned PDMS microneedle array negative template engraved with holes, heat and vacuum, so that polypropylene enters and fills the holes, and the PDMS microneedles a...
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