Silver nanowire/nano gold composite electrode based on PDMS and preparation method thereof
A technology of silver nanowires and composite electrodes, applied in the direction of material electrochemical variables, etc., can solve the problems of high price, limited indium element reserves, non-bendability, etc., and achieve high mechanical properties, low resistance, and good application prospects.
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Embodiment 1
[0030] (1) Fabrication of PDMS (polydimethylsiloxane) substrates. The substrate is fabricated by photolithography. Firstly, electronic drawing software is used to design the electrode drawing, and the drawing is printed as a mask plate by photolithography plate-making process, and then the photoresist is spin-coated on the surface of the clean silicon wafer to cover the mask plate containing the electrode pattern, and finally exposure and development are carried out , to obtain a silicon wafer template. Put it in a disposable petri dish; pour a PDMS mixed solution with a mass ratio of 10:1 on it; then put it in a vacuum desiccator to vacuum out the air bubbles in the PDMS mixed solution for 2 hours; take it out and put it in Heating and curing in a constant temperature oven at 80°C for 1 h; the finished substrate was treated with 3M adhesive tape (purchased from 3M Company in the United States) to remove the dust attached to the surface, and then put into an ultraviolet ozone...
Embodiment 2
[0036] (1) Fabrication of PDMS substrate. The substrate is fabricated by photolithography. First, electronic drawing software is used to design the electrode drawing, and the drawing is printed as a mask plate by photolithography plate-making process, and then the photoresist is spin-coated on the surface of the clean silicon wafer to cover the mask plate containing the electrode pattern, and finally exposure and development are carried out , to obtain a silicon wafer template. Put it in a disposable petri dish; pour a PDMS mixed solution with a mass ratio of 10:1 on it; then put it in a vacuum desiccator to vacuum out the air bubbles in the PDMS mixed solution for 2 hours; take it out and put it in Heating and curing in a constant temperature oven at 80°C for 1 h; the finished substrate was treated with 3M adhesive tape to remove the dust attached to the surface, and then placed in an ultraviolet ozone cleaner for 10 min to obtain a PDMS substrate with a fixed shape groove. ...
Embodiment 3
[0042] (1) Fabrication of PDMS (polydimethylsiloxane) substrates. Firstly, electronic drawing software is used to design the electrode drawing, and the drawing is printed as a mask plate by photolithography plate-making process, and then the photoresist is spin-coated on the surface of the clean silicon wafer to cover the mask plate containing the electrode pattern, and finally exposure and development are carried out , to obtain a silicon wafer template. Put it in a disposable petri dish; pour a PDMS mixed solution with a mass ratio of 10:1 on it; then put it in a vacuum desiccator to vacuum out the air bubbles in the PDMS mixed solution for 2 hours; take it out and put it in Heating and curing in a constant temperature oven at 80°C for 1 h; the finished substrate was treated with 3M adhesive tape to remove the dust attached to the surface, and then placed in an ultraviolet ozone cleaner for 10 min to obtain a PDMS substrate with a fixed shape groove.
[0043] (2) PDMS hydro...
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Abstract
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