Hafnium diboride-zirconium diboride-based high-temperature solar energy absorbing coating and preparation method thereof

A solar energy absorption, hafnium diboride technology, applied in coating, metal material coating process, ion implantation plating and other directions, can solve problems such as unfavorable industrial production, cumbersome preparation method of solar energy absorption coating, etc., to shorten the production cycle , broad practical value and application prospects, the effect of convenient operation

Active Publication Date: 2019-02-15
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, the preparation methods of solar absorbing coatings involved in the abov

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  • Hafnium diboride-zirconium diboride-based high-temperature solar energy absorbing coating and preparation method thereof

Examples

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Example Embodiment

[0023] Example 1

[0024] A preparation method of hafnium diboride-zirconium diboride-based high-temperature solar energy absorption coating is specifically carried out according to the following steps:

[0025] Step 1: Preparation of the absorption layer: Use 99.99% purity hafnium diboride and zirconium diboride as sputtering targets, and pre-extract the background vacuum of the vacuum chamber to 1.5×10 -6 Torr. Hafnium diboride uses DC magnetron sputtering technology, and zirconium diboride uses radio frequency magnetron sputtering technology. Adjust the sputtering power density of the hafnium diboride target to 2 W / cm -2 , The sputtering power density of zirconium diboride is 3W / cm -2 . During sputtering deposition, the air intake of argon gas is 20 sccm, and the absorption layer is deposited on the stainless steel substrate (roughness 4 nanometers) by dual-target co-sputtering technology, the thickness of which is 40 nm; during the sputtering process, the substrate temperatur...

Example Embodiment

[0029] Example 2

[0030] A preparation method of hafnium diboride-zirconium diboride-based high-temperature solar energy absorption coating is specifically carried out according to the following steps:

[0031] Step 1: Preparation of the absorption layer: use 99.99% purity hafnium diboride and zirconium diboride as sputtering targets, and pre-extract the background vacuum of the vacuum chamber to 6.0×10 -6 Torr. Hafnium diboride uses DC magnetron sputtering technology, and zirconium diboride uses radio frequency magnetron sputtering technology. Adjust the sputtering power density of the hafnium diboride target to 5 W / cm -2 , The sputtering power density of zirconium diboride is 7W / cm -2 . During sputtering deposition, the air intake of argon gas is 80 sccm, and the absorption layer is deposited on the nickel-based alloy substrate (roughness 8 nm) by dual-target co-sputtering technology, the thickness of which is 120 nm; during the sputtering process, the substrate temperature F...

Example Embodiment

[0035] Example 3

[0036] A preparation method of hafnium diboride-zirconium diboride-based high-temperature solar energy absorption coating is specifically carried out according to the following steps:

[0037] Step 1: Preparation of the absorption layer: Using 99.99% purity hafnium diboride and zirconium diboride as sputtering targets, pre-extract the background vacuum of the vacuum chamber to 4.5×10 -6 Torr. Hafnium diboride uses DC magnetron sputtering technology, and zirconium diboride uses radio frequency magnetron sputtering technology. Adjust the sputtering power density of the hafnium diboride target to 3.8 W / cm -2 , The sputtering power density of zirconium diboride is 4.9 W / cm -2 . During sputtering deposition, the air intake of argon gas is 35 sccm, and the absorption layer is deposited on the stainless steel substrate (roughness 5 nanometers) by dual-target co-sputtering technology, the thickness of which is 75 nm; during the sputtering process, the substrate tempera...

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Abstract

The invention provides a hafnium diboride-zirconium diboride-based high-temperature solar energy absorbing coating and a preparation method thereof. The hafnium diboride-zirconium diboride-based high-temperature solar energy absorbing coating is composed of two layers of films and sequentially comprises an absorbing layer and an anti-reflection layer upwards from the substrate surface; and the absorbing layer is constituted by a composite ceramic thin film prepared from hafnium diboride, hafnium dioxide, zirconium diboride and zirconium dioxide, and the anti-reflection layer is constituted byaluminum oxide. The hafnium diboride-zirconium diboride-based high-temperature solar energy absorbing coating provided by the invention has the high visible-infrared spectrum absorptivity, the low infrared spectrum emissivity and good heat stability, a preparation process of the coating is simple and convenient, operation is convenient, control is easy, and the production period is shortened.

Description

technical field [0001] The invention belongs to the technical field of solar thermal power generation and vacuum coating, and specifically relates to a hafnium diboride-zirconium diboride-based high-temperature solar energy absorption coating and a preparation method thereof. Background technique [0002] The solar spectrum selective absorption coating has a high absorption rate in the visible-near-infrared band and a functional film with a low emissivity in the infrared band, which is the key to improving the efficiency of light-to-heat conversion for solar collectors. With the continuous development of solar heat utilization requirements and technology, the application range of solar collector tubes has developed from low temperature applications to medium temperature applications and high temperature applications, so as to continuously meet the use requirements of medium and high temperature applications such as seawater desalination and solar power generation. The select...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/08C23C14/35F24S70/20
CPCC23C14/067C23C14/081C23C14/083C23C14/352
Inventor 高祥虎刘刚
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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