Preparation method and application of nanometer metal oxide film
A technology of oxide film and nano-metal, which is applied in the direction of chromium oxide/hydrate, chemical instruments and methods, vanadium oxide, etc., can solve the problems of low efficiency of QLED devices, high cost of nano-particle oxides, unsuitable for industrial production, etc. Achieve the effects of improving hole injection efficiency, improving construction and large-scale development, and reducing activation energy
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[0015] The embodiment of the present invention provides a method for preparing a nanometer metal oxide film, comprising the following steps:
[0016] S01. Metal powder is provided, and the metal powder is added to the reaction medium to form a dispersion;
[0017] S02. Adding an oxidizing agent to the dispersion to react to prepare a precursor solution, wherein the standard electrode potential of the oxidizing agent is >+1.23V;
[0018] S03. Depositing the precursor solution on the substrate, and annealing to obtain a nanometer metal oxide film.
[0019] In the embodiment of the present invention, to prepare a nanometer metal oxide thin film, the metal powder is first dispersed in a reaction medium, and an oxidizing agent is added to the dispersion to prepare a precursor solution; then, a nanometer metal oxide is prepared by low-temperature annealing. First of all, the method for preparing nanometer metal oxide films in the embodiment of the present invention is simple, the r...
Embodiment 1
[0049] A preparation method for a nanometer metal oxide film, comprising the following steps:
[0050] Add molybdenum powder into ethanol to form a dispersion liquid with a molybdenum powder concentration of 1-3 mol / L. After fully stirring, add 0.2-1 ml of hydrogen peroxide (30%) to 10-20 ml of the dispersion liquid, and stir for 6-24 hours to form a precursor solution. The precursor solution was dropped onto the ITO substrate, spin-coated and then annealed at low temperature to form a film.
Embodiment 2
[0052] A preparation method for a nanometer metal oxide film, comprising the following steps:
[0053] Add tungsten powder into isopropanol to form a dispersion with a concentration of tungsten powder of 1-3 mol / L. After fully stirring, add 0.2ml-2ml sodium peroxide (1mol / L) to 10-20ml of the dispersion liquid, and stir for 6h-24h to form a precursor solution. The precursor solution was dropped onto the ITO substrate, spin-coated and then annealed at low temperature to form a film.
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