A nitride memristor embedded with phase-change nanoparticles and its preparation method
A nanoparticle and nitride technology, applied in the direction of nanotechnology, nanotechnology, nanotechnology for information processing, etc., can solve the problems of unclear working medium, unclear mechanism, and very different working modes
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[0044] The present invention also proposes a method for preparing the above-mentioned memristor, comprising the following steps:
[0045] 1) Deposit a layer of inert metal (including Au, Pt or Pd) on any substrate (preferably an insulating substrate) by electron beam evaporation, thermal evaporation, magnetron sputtering or ion sputtering to form the bottom electrode ;
[0046] 2) Depositing the nitride or oxynitride film on the top surface of the formed bottom electrode by magnetron sputtering, ion sputtering, chemical vapor deposition or atomic layer deposition, using a deposition rate of a; While depositing the nitride or oxynitride film, any one of the following transition metal elements is deposited by magnetron sputtering, ion sputtering, chemical vapor deposition or atomic layer deposition, including vanadium, chromium, tantalum, molybdenum, For yttrium, hafnium, tungsten and niobium, the deposition rate adopted is b; by adjusting the relative size of a and b, the tran...
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