Memristor with continuous variable conductivity, and preparation method and application thereof
A memristor and variable technology, applied in the field of microelectronics, can solve the problems of non-conformance, increase in device conductance, etc., and achieve the effects of economical practicability and simple preparation method
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Embodiment 1
[0033] The silver / molybdenum disulfide / platinum planar structure memristor was prepared according to the following steps:
[0034] (1) The thin layer of molybdenum disulfide was peeled off from the molybdenum disulfide crystal with adhesive tape by mechanical stripping method and transferred to the thermal silicon oxide substrate, and deposited at 2.0×10 -6 mbar vacuum, 300°C annealing treatment, the annealing holding time is 1.5h;
[0035] (2) Preparation of active electrode silver with preset patterns: Find the thin layer of molybdenum disulfide under an optical microscope, and preset the shape of the active silver electrode on the thin layer of molybdenum disulfide by ultraviolet lithography, and then use magnetron sputtering method Deposit active electrode silver, and finally remove the glue and peel off to obtain active electrode silver;
[0036] (3) Prepare the inert electrode platinum with the preset pattern: at the position 200nm away from the active silver electrode,...
Embodiment 2
[0040] The silver / tungsten disulfide / platinum planar structure memristor is prepared according to the following steps:
[0041] (1) The thin layer of tungsten disulfide was peeled off from the tungsten disulfide crystal with adhesive tape by the mechanical stripping method and transferred to the thermal oxide substrate, and placed on a 2.0×10 -6 mbar vacuum, 300°C annealing treatment, the annealing holding time is 1.5h;
[0042] (2) Preparation of active electrode silver with preset patterns: Find the thin layer of tungsten disulfide under an optical microscope, and preset the shape of the active silver electrode on the thin layer of tungsten disulfide by ultraviolet lithography, and then use magnetron sputtering method Deposit active electrode silver, and finally remove the glue and peel off to obtain active electrode silver;
[0043] (3) Preparation of platinum inert electrode with preset pattern: At a position 380nm away from the active silver electrode, the shape of plati...
Embodiment 3
[0053] The silver / molybdenum disulfide / platinum planar structure memristor prepared in Example 1 is applied to the learning and memory behavior of simulated fruit flies, as shown in the attached Figure 7 shown;
[0054] Under electrical stimulation, Drosophila will generate memory for the stimulus pulse, and the process of Drosophila generating memory under electrical stimulation is called the learning behavior of Drosophila. attached Figure 7 a is the relationship between the memory level of Drosophila and the number and intensity of electrical pulses. It can be seen that the memory level of Drosophila increases significantly with the increase of the number and intensity of electrical pulses. attached Figure 7 b is the variation of the conductance of the silver / molybdenum disulfide / platinum planar structure memristor prepared in Example 1 with the number of electric pulses and the intensity of electric pulses. Contrast attached Figure 7 a and attached Figure 7 b It ...
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