A method for preparing nano-sized polymer brush arrays using gold nanoparticles

A gold nanoparticle, nanometer-sized technology, applied in the field of material science, can solve the problems of complex instruments, high cost, etc., and achieve the effects of high repeatability, simple steps, and easy operation.

Active Publication Date: 2020-12-22
长春润凝泰思生物科技有限公司
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the current research, the preparation of patterned polymeric molecular brush arrays is mostly patterned arrays with a size above the micron scale, and the preparation of submicron or even nanoscale molecular brush arrays requires the use of complex instruments and high-cost equipment. method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for preparing nano-sized polymer brush arrays using gold nanoparticles
  • A method for preparing nano-sized polymer brush arrays using gold nanoparticles
  • A method for preparing nano-sized polymer brush arrays using gold nanoparticles

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Embodiment 1: Cleaning and hydrophilic treatment of silicon substrate

[0025] Cut the monocrystalline silicon substrate (100) into a square with a side length of 2 cm with a glass knife, ultrasonically use acetone, ethanol, and deionized water for 5 minutes, and then place it in 98% concentrated sulfuric acid and 30% mass fraction. Heat and boil in a mixed solution of hydrogen peroxide (volume ratio 7:3) for 60 minutes to make the surface hydrophilic; wash the hydrophilic silicon substrate with deionized water repeatedly for 3 times, and store it in dehydrated ethanol for later use.

Embodiment 2

[0026] Example 2: Synthesis of gold nanoparticles of different sizes

[0027] Add 145mL deionized water and 5.5mL 60mmol / L sodium citrate aqueous solution into a 250mL three-necked flask, stir and heat to boiling. After boiling, the temperature was lowered to maintain a slightly boiling state, and 1045 μL of 1% chloroauric acid aqueous solution was added to react for 10 minutes to obtain gold nano-seeds. Cool the solution to 90°C, add 1045 μL mass fraction of 1% chloroauric acid aqueous solution, and react for 30 minutes; then add 1045 μL mass fraction of 1% chloroauric acid aqueous solution, react for 30 minutes, and pour out 75 mL of gold nanoparticles to obtain the first generation of gold nanoparticles. Particle sol; Repeatedly add 73mL deionized water and 2mL, 60mmol / L sodium citrate solution to the three-necked flask and heat to 90°C, add 1045μL mass fraction of 1% chloroauric acid aqueous solution, react for 30min; then add 1045μL mass fraction of 1% chloroauric acid a...

Embodiment 3

[0028] Embodiment 3: the preparation of surface amide silicon substrate

[0029] Take out the silicon substrate prepared in Example 1, place it in an oxygen plasma cleaning machine and clean it for 5 minutes, put it into a weighing bottle, and add 15 mL of γ-aminopropyltriethoxy with a volume fraction of 1%. Ethanol solution of silane, soak for 30min. Take out the substrate and clean it with absolute ethanol for 3 minutes under 50% power ultrasonic, then put it into an oven at 120° C. for 2 hours, take it out and cool it. In this step, an amination-modified silicon substrate is obtained.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
heightaaaaaaaaaa
diameteraaaaaaaaaa
Login to view more

Abstract

A method for preparing a nanoscale polymer brush array through gold nanoparticles belongs to the technical field of material science. The method comprises combining the absorbing effects of metal nanoparticles and interface groups with plasma etching to prepare a silynized amino array on the surface of a silicon substrate and performing surface-initialized atom transfer radical polymerization on the amino array to prepare the nanoscale polymer molecular brush array on a large-area substrate. By changing the absorbing time of the nanoparticles, a density-gradient molecular brush array is prepared; by changing the growth time of the metal nanoparticles, a size-gradient polymer molecular brush array is prepared. The height of the prepared nanoparticle array is 2.5-13 nm, and the size of the prepared nanoparticle array is 28-80 nm. The method for preparing the nanoscale polymer brush array through the gold nanoparticles is simple in process and operation and high in repeatability, involvesno expensive instruments, and with excellent universality, can be applied to preparation as well as functionalized application of various polymers.

Description

technical field [0001] The invention belongs to the technical field of material science, and in particular relates to a method for preparing a polymer molecular brush array with controllable nanometer size, adjustable size and density gradient by using gold nanoparticles. Background technique [0002] The preparation of polymer molecular brushes using surface-initiated controlled atom transfer radical polymerization technique is a very powerful way to link the chemical and physical properties of interfaces and has attracted great attention in surface and interface engineering. This polymer molecular brush interface can be applied to many emerging research fields, including stimuli-responsive surfaces and colloids (Wang X, Qing G, Jiang L, Chemical Communications, 2009(19):2658-2660.), field effect Transistors and photovoltaic devices (Tria M C, Liao K S, Journal of Materials Chemistry, 2011, 21 (28): 10261-10264.), bioengineering field (Fristrup C J, Jankova K, Hvilsted S. S...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C08F292/00C08F220/20B22F9/24
CPCB22F9/24C08F292/00C08F220/20
Inventor 张俊虎陈星池薛培宏杨柏
Owner 长春润凝泰思生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap