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High temperature-resistant solvent-based polyurethane material with monomer structure containing biphenylphthalazine structure, and preparation method thereof

A technology of polyurethane material and monomer structure, which is applied in the field of polymer science to achieve the effects of excellent and stable mechanical properties, improved solubility, and improved mechanical stability

Inactive Publication Date: 2019-04-19
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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  • High temperature-resistant solvent-based polyurethane material with monomer structure containing biphenylphthalazine structure, and preparation method thereof
  • High temperature-resistant solvent-based polyurethane material with monomer structure containing biphenylphthalazine structure, and preparation method thereof
  • High temperature-resistant solvent-based polyurethane material with monomer structure containing biphenylphthalazine structure, and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0058] The raw material 1wt% of the monomer of the naphthyridine structure is refined: the monomer of the naphthyridine structure is mixed with N,N-dimethylacetamide at a mass:volume ratio of 1:2( g: ml) was added to a three-neck flask equipped with a spherical condenser and a stirrer, heated to reflux for 0.5h, and filtered hot, and the obtained filter bottle was washed with alcohol for 1 to 4 times, filtered, dried, and placed in a vacuum at 120°C The oven was evacuated for 24 hours to obtain a monomeric white powder of naphthyridine structure; 64.53% polyester polyol PCL2000 was vacuum dehydrated at 120°C for 2 hours until no bubbles were generated; other raw materials such as chain extenders, end-capping agents, Put the solvent etc. into 4A molecular sieve and soak for 24h.

[0059] A: 64.53wt% polyester polyol PCL2000, 6.58wt% chain extender, 1wt% monomer of naphthyridine structure, 0.1wt% catalyst, add solvent, control single The concentration of body in the solvent is ...

Embodiment 2

[0063] The raw material 2wt% of the naphthalene structure monomer is refined: the phthalazine structure monomer and N,N-dimethylacetamide are mixed at a mass:volume ratio of 1:2( g: ml) was added to a three-necked flask equipped with a spherical condenser and a stirrer, heated to reflux for 0.5h, and filtered hot. Vacuum for 24 hours to obtain monomer white powder with naphthyridine structure; 61.35% polyester polyol PCL2000 was vacuum dehydrated at 120°C for 2 hours until no bubbles were generated; other raw materials such as chain extenders, end-capping agents, solvents, etc. Put into 4A molecular sieve and soak for 24h.

[0064] A: 61.35wt% polyether polyol or polyester polyol polyol, 7.00wt% chain extender, 2wt% monomer of naphthyridine structure, 0.1wt% catalyst, add solvent, control diazepine The concentration of the monomer of naphthalene structure in the solvent is 2wt%, 55 ℃, mix uniformly in N 2 React under gas protection.

[0065] B: 60%-80% of the total amount o...

Embodiment 3

[0068] The raw material 3wt% of the naphthalene structure monomer is refined: the monomer of the phthalazine structure and N,N-dimethylacetamide are mixed at a mass:volume ratio of 1:2( g: ml) was added to a three-neck flask equipped with a spherical condenser and a stirrer, heated to reflux for 0.5h, and filtered hot, and the obtained filter bottle was washed with alcohol for 1 to 4 times, filtered, dried, and placed in a vacuum at 120°C The oven was evacuated for 24 hours to obtain a monomeric white powder of naphthyridine structure; 57.67% polyester polyol PCL2000 was vacuum dehydrated at 120°C for 2 hours until no bubbles were generated; other raw materials such as chain extenders, end-capping agents, Put the solvent etc. into 4A molecular sieve and soak for 24 hours.

[0069] A: 57.67wt% polyester polyol PCL2000, 7.5wt% chain extender, 3wt% monomer of naphthyridine structure, 0.1wt% catalyst, add solvent, control the single structure of naphthyridine The concentration of...

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Abstract

The invention discloses a high temperature-resistant solvent-based polyurethane material with the monomer structure containing a biphenylphthalazine structure, and a preparation method thereof. The defects of poor high temperature resistance and poor radiation resistance of traditional solvent-based polyurethane materials are overcome from the perspective of the design of the molecular structure of a polymer. The polyurethane material designed in the invention is prepared by polymerizing diisocyanate, polyether or polyester polyol, a chain extender, a catalyst, an end capping agent, and a monomer containing the biphenylphthalazine structure. The polyurethane material not only improves the heat resistance and the radiation resistance of the polyurethane material, and also maintains excellent mechanical properties, and cured products of the polyurethane material can be used for a long period under a high temperature (200 DEG C) condition.

Description

technical field [0001] The invention belongs to the field of polymer science and technology, and relates to a method for synthesizing and preparing high-temperature-resistant solvent-based polyurethane containing a naphthyridine structure. Background technique [0002] Polyurethane is one of the six major synthetic materials (PE, PP, PVC, PS, PET, PU) in the world. It is a polymer material with unique novel properties and multiple uses. With the development of polyurethane chemical research, product manufacturing and application technology Progress and the continuous expansion of application fields. Over the past 20 years, polyurethane product varieties and industrial scale have expanded rapidly, and it has become one of the fastest-growing polymer synthetic material industries. Especially in recent years, mainland China has become the fastest-growing polyurethane market center in the world, and at the same time, technological progress in production, application, research a...

Claims

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Application Information

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IPC IPC(8): C08G18/32
CPCC08G18/3848
Inventor 蹇锡高王锦艳刘程张守海翁志焕胡方圆柳承德宗立率
Owner DALIAN UNIV OF TECH
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