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A preparation method of large aspect ratio probes based on one-dimensional nanomaterials

A nanomaterial, large aspect ratio technology, applied in the field of micro-nano manufacturing and measurement, can solve the problems of affecting imaging resolution, low preparation efficiency, imaging artifacts, etc., to overcome imaging artifacts, the method is simple and feasible, and good resolution Effect

Active Publication Date: 2020-03-17
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the conductive adhesive bonding method uses an optical microscope. When bonding carbon nanotubes, it is easy to choose thicker carbon nanotube bundles instead of the thinnest carbon nanotubes, which affects the resolution of imaging.
At present, the core problems restricting this application are low preparation efficiency, high cost, and easy to produce imaging artifacts

Method used

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  • A preparation method of large aspect ratio probes based on one-dimensional nanomaterials
  • A preparation method of large aspect ratio probes based on one-dimensional nanomaterials
  • A preparation method of large aspect ratio probes based on one-dimensional nanomaterials

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] (1) Cleaning of the substrate

[0045] The newly dissociated mica sheet is used as the substrate, and the petri dish is used as the liquid pool for the liquid. In order to ensure the purity of the liquid and avoid the introduction of impurities, which will pollute the needle tip, it is necessary to ensure the cleanliness of the sample surface. Firstly, immerse the mica flakes in acetone. After 10 minutes, take the mica flakes with tweezers and soak in ethanol. After 10 min, take the mica flakes with tweezers and rinse them with deionized water for 5 minutes. Then dry them with nitrogen immediately. The mica sheet base is stored in a closed container to prevent the absorption of excessive water vapor in the air.

[0046] (2) Configuration of growth solution

[0047] First prepare the first solution: dissolve 2.4g aluminum trichloride hexahydrate in 15mL ethanol solution, then slowly inject 1.2mL silicon tetrachloride solution with a pipette, and place the prepared solution in ...

Embodiment 2

[0054] The steps of cleaning the substrate and picking up the growth solution are the same as in Example 1. The difference between this example and 1 is that the first solution configured in step (2) contains 4.8 g of aluminum trichloride hexahydrate and the capacity of ethanol is 30 mL. The capacity of silicon tetrachloride is 2.4 mL; the second solution contains 4 g of ferric chloride hexahydrate and 10 mL of ethanol. After the growth solution is picked up in step (4), silicon oxide nanowires are synthesized at the tip of the prefabricated needle, and silane is used. The gas is used as the silicon source, and the flow is controlled to 10 sccm. At the same time, 100 sccm high-purity helium is introduced as the carrier gas. The reaction time is 2 h. After the reaction, the sample is quickly cooled to room temperature under the protection of high-purity helium.

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Abstract

The invention discloses a large length-diameter ratio probe preparation method based on one-dimensional nano materials. A probe includes an atomic force microscope ordinary silicon probe and a nano structure of the tip end. The preparation method of the probe includes the steps that the atomic force microscope silicon probe is mounted on a measuring head of atomic force microscope equipment equipped with a liquid tank capable of having a tapping mode; then a small amount of solution, namely a growth solution, prepared by mixing two solutions is injected in a liquid pool, and probe inserting ismanually controlled to pick up the growth solution; and finally, after pickup of the growth solution is completed, the one-dimensional nano materials are synthesized at the tip end of a prefabricatedsilicon probe, and a probe point with a large length-diameter ratio is manufactured. According to the preparation method, the problem that imaging illusion is prone to occurring due to the fact thatthe atomic force ordinary silicon probe is presently used for imaging a high depth-width ratio minute structure is solved, the length-diameter ratio of the obtained probe is large, and a better resolution ratio on structural measurement can be obtained.

Description

Technical field [0001] The invention belongs to the technical field of micro-nano manufacturing and measurement, and specifically relates to a method for preparing a probe with a large aspect ratio based on one-dimensional nanomaterials. Background technique [0002] In recent years, large-scale integrated circuits, micro-spacecraft control, vehicle stealth, and other fields have developed rapidly. These emerging technologies rely to a large extent on complex and precise microstructures, especially microstructures with high complexity and high aspect ratio. It has very broad application prospects in these fields. Compared with the planar structure, the high aspect ratio (aspect ratio is the ratio of the maximum depth / width of the fine structure) three-dimensional structure has a larger specific surface area, which means that a larger vertical dimension can be obtained while maintaining the same substrate area. Available space opens up new ideas and wider application areas for th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01Q60/38
Inventor 杨树明程碧瑶王飞
Owner XI AN JIAOTONG UNIV