Photosensitive resin composition

A technology of photosensitive resin and composition, which is applied in optics, photomechanical equipment, and photosensitive materials used in optomechanical equipment, etc., and can solve the problems of Taper over-regulation, leveling agent washing off, and molten photoresist material wetting the substrate. To reduce the roughness and improve the effect of Taper

Active Publication Date: 2019-06-18
GUAN ETERNAL MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The present invention aims to solve the problem of poor wetting of the molten photoresist material to the substrate due to the

Method used

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Example Embodiment

[0041] The preparation method of the above-mentioned color filter may include: coating the above-mentioned photosensitive resin composition on a substrate, and sequentially undergoing pre-baking, exposure, development and post-baking steps to obtain the color filter.

[0042] The present invention also relates to the preparation of the leveling agent I, including

[0043] Polymerization reaction step: use a four-necked flask as a reaction vessel, respectively connect to a thermometer, a condenser (condensation reflux), a protective nitrogen inlet and a stirring blade. When synthesizing this leveling agent, use benzoyl peroxide (BPO) or azobisisobutyronitrile (AIBN) as the initiator. The stirring speed is 120-180rpm, and the monomer, initiator, chain transfer agent solution gradually turns to xylene Add dropwise for 1 to 2h. After the dropwise addition is completed, continue solution polymerization in xylene at 60 to 80°C for 2 to 4 hours. The target molecular weight Mw=8000~10000...

Example Embodiment

[0047] Example 1. Preparation of leveling agent A

[0048] Weigh 30 parts by weight of hexafluorobutyl acrylate, 30 parts by weight of styrene, 20 parts by weight of maleimide, and 20 parts by weight of myrcene; and 6 parts by weight of initiator AIBN and 0.5 parts by weight of chain transfer agent dodecanethiol, Dissolve in 100 parts by weight of xylene, mix well and place in a constant pressure funnel. In addition, 50 parts by weight of xylene was weighed into a four-necked flask, protected by nitrogen, heated to 65°C, and stirred to 150 revolutions per minute (rpm).

[0049] Synthesis: The premixed monomer and initiator solutions are added dropwise to xylene to control the dropping rate. The entire dropping process takes 2 hours. After the dropping is completed, keep the temperature and continue to stir for 3 hours, then add MEHQ 0.5 parts by weight terminates the reaction.

[0050] Post-treatment: Use the dropwise method to cool the xylene solution obtained from the reaction to...

Example Embodiment

[0052] Example 2. Preparation of leveling agent B

[0053] 40 parts by weight of hexafluorobutyl acrylate, 30 parts by weight of acrylonitrile, 15 parts by weight of maleimide, 15 parts by weight of undecene; 7 parts by weight of initiator AIBN and 0.5 parts by weight of chain transfer agent dodecane , Dissolved in 100 parts by weight of xylene, mixed well and placed in a constant pressure funnel. In addition, 50 parts by weight of xylene was weighed into a four-necked flask, and nitrogen gas was introduced, the temperature was raised to 60°C, and the stirring was turned on to 150 rpm.

[0054] Synthesis: The premixed monomer and initiator solutions are added dropwise to xylene to control the dropping rate. The entire dropping process takes 1.5 hours. After the dropping is completed, keep the temperature and continue to stir for 4 hours. Add 0.5 parts by weight of MEHQ terminates the reaction.

[0055] Post-treatment: Use the dropwise method to cool the xylene solution obtained fro...

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Abstract

The invention relates to a photosensitive resin composition. The photosensitive resin composition comprises a flatting agent I, wherein the flatting agent I is prepared by polymerization of the following monomers in parts by weight: (a) 20-40 parts of hexafluorobutyl acrylate, (b) 20-40 parts of monomers with glass transition temperature greater than 100 DEG C, (c) 10-20 parts of maleimide, and (d) 10-20 parts of C8-C18 olefin monomers. When the photosensitive resin composition is used for preparing a color filter, the surface roughness of a photoresist material can be remarkably lowered, Taper is effectively improved, and the photosensitive resin composition is excellent in slope.

Description

technical field [0001] The invention belongs to the field of liquid crystal displays, and in particular relates to a photosensitive resin composition used for preparing color filters. Background technique [0002] The color filter is a key device for liquid crystal display to achieve colorization, and the performance of the color photoresist / photoresist used to prepare the color filter directly affects the display effect of the liquid crystal display. The general preparation process of color filters includes glue coating-pre-baking-exposure-development-post-baking. Since the photoresist surface is cured better during the exposure process, it is easy to have a phenomenon that the upper part has a high degree of polymerization and the lower part has a low degree of polymerization. . In this way, an inverted trapezoidal structure tends to appear under the flushing action of developing. This inverted trapezoidal structure will collapse into a positive trapezoidal shape as the ...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/004
Inventor 孙涛刘永祥桑伟
Owner GUAN ETERNAL MATERIAL TECH
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