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Photosensitive resin composition

A technology of photosensitive resin and composition, which is applied in optics, photomechanical equipment, and photosensitive materials used in optomechanical equipment, etc., and can solve the problems of Taper over-regulation, leveling agent washing off, and molten photoresist material wetting the substrate. To reduce the roughness and improve the effect of Taper

Active Publication Date: 2019-06-18
GUAN ETERNAL MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention aims to solve the problem of poor wetting of the molten photoresist material to the substrate due to the fact that the leveling agent is easily washed off by the developer when the color filter is manufactured. The resulting Taper overrule

Method used

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preparation example Construction

[0041] The preparation method of the above-mentioned color filter may include: coating the above-mentioned photosensitive resin composition on a substrate, and sequentially undergoing steps of pre-baking, exposure, development and post-baking to obtain the color filter.

[0042] The present invention also relates to the preparation of said leveling agent I, comprising

[0043] Polymerization reaction step: use a four-necked flask as a reaction vessel, and connect a thermometer, a condenser (condensing reflux), a nitrogen inlet for protection, and a stirring paddle respectively. When synthesizing this leveling agent, benzoyl peroxide (BPO) or azobisisobutyronitrile (AIBN) is used as the initiator, and the stirring speed is 120-180rpm, and the solution of monomer, initiator, and chain transfer agent gradually turns to xylene Add dropwise for 1 to 2 hours. After the dropwise addition, continue to carry out solution polymerization in xylene at 60-80°C for 2-4 hours. The target m...

Embodiment 1

[0047] Embodiment 1. Preparation of leveling agent A

[0048] Weigh 30 parts by weight of hexafluorobutyl acrylate, 30 parts by weight of styrene, 20 parts by weight of maleimide, 20 parts by weight of myrcene; and 6 parts by weight of initiator AIBN, 0.5 parts by weight of chain transfer agent dodecyl mercaptan, Dissolve in 100 parts by weight of xylene, mix well and place in a constant pressure funnel. In addition, 50 parts by weight of xylene was weighed and added into a four-neck flask, protected by nitrogen gas, heated to 65° C., and started to stir to 150 revolutions per minute (rpm).

[0049] Synthesis: Add the premixed monomer and initiator solution dropwise to xylene, and control the drop rate. The whole drop process takes 2 hours. After the drop is completed, keep stirring for 3 hours and add MEHQ 0.5 parts by weight to terminate the reaction.

[0050] Post-processing: use dropwise addition, after cooling the xylene solution obtained from the reaction to room tempe...

Embodiment 2

[0052] Embodiment 2. Preparation of leveling agent B

[0053] Use 40 parts by weight of hexafluorobutyl acrylate, 30 parts by weight of acrylonitrile, 15 parts by weight of maleimide, 15 parts by weight of undecene; and 7 parts by weight of initiator AIBN, 0.5 parts by weight of chain transfer agent dodecanethiol , dissolved in 100 parts by weight of xylene, mixed evenly and placed in a constant pressure funnel. In addition, 50 parts by weight of xylene was weighed and added into a four-neck flask, protected by nitrogen gas, the temperature was raised to 60° C., and the stirring was started to 150 rpm.

[0054] Synthesis: Add the premixed monomer and initiator solution dropwise to xylene, and control the drop rate. The whole drop process takes 1.5 hours. After the drop is completed, keep the temperature and continue to stir for 4 hours. Add 0.5 parts by weight of MEHQ terminated the reaction.

[0055] Post-processing: use dropwise addition, after cooling the xylene solution ...

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Abstract

The invention relates to a photosensitive resin composition. The photosensitive resin composition comprises a flatting agent I, wherein the flatting agent I is prepared by polymerization of the following monomers in parts by weight: (a) 20-40 parts of hexafluorobutyl acrylate, (b) 20-40 parts of monomers with glass transition temperature greater than 100 DEG C, (c) 10-20 parts of maleimide, and (d) 10-20 parts of C8-C18 olefin monomers. When the photosensitive resin composition is used for preparing a color filter, the surface roughness of a photoresist material can be remarkably lowered, Taper is effectively improved, and the photosensitive resin composition is excellent in slope.

Description

technical field [0001] The invention belongs to the field of liquid crystal displays, and in particular relates to a photosensitive resin composition used for preparing color filters. Background technique [0002] The color filter is a key device for liquid crystal display to achieve colorization, and the performance of the color photoresist / photoresist used to prepare the color filter directly affects the display effect of the liquid crystal display. The general preparation process of color filters includes glue coating-pre-baking-exposure-development-post-baking. Since the photoresist surface is cured better during the exposure process, it is easy to have a phenomenon that the upper part has a high degree of polymerization and the lower part has a low degree of polymerization. . In this way, an inverted trapezoidal structure tends to appear under the flushing action of developing. This inverted trapezoidal structure will collapse into a positive trapezoidal shape as the ...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/004
Inventor 孙涛刘永祥桑伟
Owner GUAN ETERNAL MATERIAL TECH
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