Method for preparing super-thick Ti-Al-C ternary coating using two-step method PVD technology

A ti-al-c, coating technology, applied in the coating, metal material coating process, ion implantation plating, etc., can solve the inconvenience of long-term use and other problems, to achieve dense and smooth coating, good high temperature oxidation resistance , excellent binding effect

Active Publication Date: 2019-07-02
NUCLEAR POWER INSTITUTE OF CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The technical problem to be solved by the present invention is that the existing technology for preparing ultra-thick Ti-Al-C ternary surface protective coating on materials cannot be well adapted to the high-temperature and high-pressure environment in the nuclear field, and the existing technology cannot obtain At the same time as a thicker coating, it has better oxidation resistance and corrosion resistance, which is not convenient for long-term use. The purpose is to provide a method for preparing ultra-thick Ti-Al-C ternary coatings by two-step PVD technology to solve the problem. Preparation of Ultra-Thick Ti-Al-C Ternary Surface Protective Coating

Method used

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  • Method for preparing super-thick Ti-Al-C ternary coating using two-step method PVD technology
  • Method for preparing super-thick Ti-Al-C ternary coating using two-step method PVD technology
  • Method for preparing super-thick Ti-Al-C ternary coating using two-step method PVD technology

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Embodiment 1

[0034] Such as figure 1 Shown, a kind of two-step method PVD technique of the present invention prepares the method for ultra-thick Ti-Al-C ternary coating, comprises the following steps:

[0035] Pre-preparation of Ti-Al-C ternary coating

[0036] (1) Pretreatment: Ultrasonic surface cleaning is performed on the zirconium substrate with acetone and deionized water respectively. After drying in a vacuum drying chamber, the sample is placed on the three-dimensional turret in the vacuum chamber, and the distance between the target and the base is kept at 200mm. Close it A high vacuum is drawn behind the furnace door, and the vacuum degree reaches 3.5×10 -3 After that, start to heat slowly;

[0037] (2) Ion cleaning: After reaching the coating temperature of 350°C, fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning on the substrate sample, or use an electron gun to heat, clean and etch the substrate sample to further clean the surface of the substrate...

Embodiment 2

[0045] Step 1: Pre-preparation of Ti-Al-C ternary coating

[0046] (1) Pretreatment: Ultrasonic surface cleaning is performed on the zirconium substrate with acetone and deionized water respectively. After drying in a vacuum drying chamber, the sample is placed on the three-dimensional turret in the vacuum chamber, and the distance between the target and the base is kept at 200mm. Close it A high vacuum is drawn behind the furnace door, and the vacuum degree reaches 3.5×10 -3 After that, start to heat slowly;

[0047] (3) Ion cleaning: After reaching the coating temperature of 350°C, fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning on the substrate sample, or use an electron gun to heat, clean and etch, and further clean the surface of the substrate sample . The Ar pressure is 2.0Pa, the bias voltage is -150V, the duty cycle is 70%, the buncher coil current is 11A, the electron gun power supply voltage is 45V, the current is 90A, and the cleaning...

Embodiment 3

[0055] (1) Pretreatment: Ultrasonic surface cleaning is performed on the zirconium substrate with acetone and deionized water respectively. After drying in a vacuum drying chamber, the sample is placed on the three-dimensional turret in the vacuum chamber, and the distance between the target and the base is kept at 200mm. Close it A high vacuum is drawn behind the furnace door, and the vacuum degree reaches 3.5×10 -3 After that, start to heat slowly;

[0056] (4) Ion cleaning: After reaching the coating temperature of 350°C, fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning on the substrate sample, or use an electron gun to heat, clean and etch, and further clean the surface of the substrate sample . The Ar pressure is 2.0Pa, the bias voltage is -150V, the duty cycle is 70%, the buncher coil current is 11A, the electron gun power supply voltage is 45V, the current is 90A, and the cleaning time is 30 minutes.

[0057] (3) Formation of the base coat...

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Abstract

The invention discloses a method for preparing super-thick Ti-Al-C ternary coating using a two-step method PVD technology. The surface of a zircon encased matrix sample is cleaned, the sample is clamped on a three-dimensional rotary frame in a vacuum chamber after being blown to dry by cold air, and the matrix sample is heated; Ar gas is inflated, high bias pressure is applied, and the matrix sample is subjected to glow sputtering cleaning or electron gun heating cleaning etching; a Ti<x>Al arc target is opened by using an arc striking needle, a Ti<x>Al target material is subjected to high bias pressure sputtering cleaning, and meanwhile a base layer is generated on the surface of the matrix; a Ti<x>Al coating is deposited in low bias pressure, and a transition coating is generated; appropriate arc current and bias pressure are adjusted, a mid-frequency magnetically controlled graphite target is opened, and the super-thick Ti-Al-C coating is deposited; and high temperature annealing isconducted. Material prepared from the method for preparing super-thick Ti-Al-C ternary coating using the two-step method PVD technology can be more suitable for the field of nuclear, using is safer,and the obtained materials have better performance.

Description

technical field [0001] The invention relates to the coating field, in particular to a method for preparing an ultra-thick Ti-Al-C ternary coating by a two-step PVD technique. Background technique [0002] MAX phase materials combine some excellent properties of metals and ceramics, with ceramic properties such as low density, low thermal expansion coefficient, high elastic modulus and high strength, and metals such as good thermal conductivity, easy processing, thermal shock resistance and damage performance. These excellent properties make the MAX phase material of great value in surface coating applications, and it is a promising candidate material for surface wear resistance and high temperature oxidation resistance coatings. Ti-Al-C ternary compound (Ti 2 AlC or Ti 3 AlC 2 ) has excellent high-temperature oxidation resistance, and a layer of dense and continuous Al is formed after the surface Al is oxidized at high temperature. 2 o 3 The protective film effectively...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/32C23C14/35C23C14/58
CPCC23C14/0036C23C14/0635C23C14/325C23C14/35C23C14/5806C23C14/5853
Inventor 杨红艳张瑞谦韦天国闫萌陈乐邱绍宇彭小明
Owner NUCLEAR POWER INSTITUTE OF CHINA
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