A kind of lateral nanocavity array structure SERS substrate and preparation method thereof
An array structure and lateral technology, which is applied in the field of lateral nanocavity array structure SERS substrate and its preparation, can solve the problems of different electrical environments with the same current density and the inability to effectively build electric field strength, etc.
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Embodiment 1
[0040] A SERS substrate with a lateral nanocavity array structure. The lateral nanocavity array is composed of semi-open hollow microspheres with hollow cavities inside. The inner diameter is 450nm, and a horizontal opening with a diameter of 300nm Pores, the inner layer of the semi-open hollow microspheres is TiO with a surface modification of 4-MBA probe molecule thickness of 6nm 2 thin film, on TiO 2 The outside of the film is also plated with a layer of Au film with a thickness of 50nm.
[0041] Its preparation method comprises the following steps:
[0042] 1) The two-dimensional hexagonal close-packed polystyrene sphere array template was prepared by self-assembly method. The specific preparation method is as follows:
[0043] (1.1) Cleaning of silicon wafers. Put the silicon wafer into a beaker filled with ammonia water, hydrogen peroxide, and deionized water (volume ratio 1:2:6), heat to 100°C and boil for 5 minutes in a fume hood. After standing it at room temperatur...
Embodiment 2
[0051] A SERS substrate with a lateral nanocavity array structure, the lateral nanocavity array is composed of semi-open hollow microspheres with hollow cavities inside, the inner diameter is 400nm, and a horizontal opening with a diameter of 250nm Pores, the inner layer of the semi-open hollow microspheres is TiO with a surface modification of 4-MBA probe molecule thickness of 5nm 2 thin film, on TiO 2 The outside of the film is also coated with a layer of Ag film with a thickness of 40nm.
[0052] Its preparation method comprises the following steps:
[0053] 1) The two-dimensional hexagonal close-packed polystyrene sphere array template was prepared by self-assembly method. The specific preparation method is as follows:
[0054] (1.1) Cleaning of silicon wafers: Put the silicon wafers into a beaker filled with ammonia water, hydrogen peroxide, and deionized water (volume ratio 1:1.5:5), heat to 100°C in a fume hood and boil for 3 minutes. After standing it at room temper...
Embodiment 3
[0062] A SERS substrate with a lateral nanocavity array structure, the lateral nanocavity array is composed of semi-open hollow microspheres with hollow cavities inside, the inner diameter is 480nm, and a horizontal opening with a diameter of 350nm Pores, the inner layer of the semi-open hollow microspheres is TiO with a surface modification of 4-MBA probe molecule thickness of 8nm 2 thin film, on TiO 2 The outside of the film is also plated with a layer of Ag film with a thickness of 60nm.
[0063] Its preparation method comprises the following steps:
[0064] 1) The two-dimensional hexagonal close-packed polystyrene sphere array template was prepared by self-assembly method. The specific preparation method is as follows:
[0065] (1.1) Cleaning of silicon wafers: Put the silicon wafers into a beaker filled with ammonia water, hydrogen peroxide, and deionized water (volume ratio 1:2.5:8), heat to 100°C in a fume hood and boil for 10 minutes. After standing it at room tempe...
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