Highly-tolerant organic solvent separation membrane and preparation method thereof

An organic solvent and separation membrane technology, applied in the field of high tolerance organic solvent separation membrane and its preparation, can solve the problems of high temperature, PEEK crystal structure damage, difficult application, etc., and achieve strong high temperature resistance, acid and alkali resistance, Effect of good solubility and processability, excellent solvent resistance

Active Publication Date: 2019-07-26
CHANGCHUN INST OF APPLIED CHEMISTRY - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, its resistance to organic solvents also brings difficulties to the preparation of PEEK membranes by solution methods.
Most of the existing technologies for preparing PEEK membranes are as follows: 1) using methanesulfonic acid, sulfuric acid, trifluoromethanesulfonic acid, etc. Membrane liquid has strong acidity and strong oxidizing properties, so it is difficult to apply in actual production; in addition, because the process is a process of sulfonation and dissolution, most of the crystal structure of PEEK has been destroyed, and its solvent resistance is greatly wea

Method used

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  • Highly-tolerant organic solvent separation membrane and preparation method thereof
  • Highly-tolerant organic solvent separation membrane and preparation method thereof
  • Highly-tolerant organic solvent separation membrane and preparation method thereof

Examples

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Example Embodiment

[0029] The present invention provides a method for preparing a highly resistant organic solvent separation membrane, which includes the following steps:

[0030] a) Using the phase inversion method to make the casting liquid into a membrane to obtain an asymmetric membrane; the casting liquid includes a solvent and a polymer containing a Schiff base structure;

[0031] b) placing the asymmetric membrane in an acid solution for acidification to obtain a highly resistant organic solvent separation membrane.

[0032] In the preparation method provided by the present invention, a film casting solution is first provided, and the film casting solution includes a solvent and a polymer containing a Schiff base structure. Wherein, the solvent includes but not limited to one of N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, 1,4-dioxane and tetrahydrofuran or Many kinds. In an embodiment provided by the present invention, the solvent includes N-methylpyrrolidone and tetrah...

Example Embodiment

[0068] Example 1

[0069] Put 1mol of the dihalogen monomer of formula (II) (where R 1 Is phenyl, X is -F), 1mol of the diphenol monomer (R 2 Is phenyl) and 2.01mol anhydrous K 2 CO 3 Add a 2L three-necked flask with mechanical stirring, water separator and condenser, and add 1L N-methylpyrrolidone, then add 300mL toluene, 2 Heat to 140°C with water for 2h under the atmosphere, then distill the water-carrying agent and polymerize at 170°C for 6h, then sink the polymer into water, wash it with deionized water several times, and dry it under vacuum at 100°C for 24h to obtain Polymer of formula (i):

[0070]

[0071] In formula (i), R 1 , R 2 All are phenyl, z=1, n=200.

Example Embodiment

[0072] Example 2

[0073] Put 0.8mol formula (II) structure dihalogen monomer (wherein R 1 Is phenyl, X is -F), 0.2mol of dihalogen monomer of formula (III) (where X is -F), 1mol of diphenol monomer of formula (IV) (R 2 Is phenyl) and 2.01mol anhydrous K 2 CO 3 Add a 2L three-necked flask with mechanical stirring, water separator and condenser, and add 1L N-methylpyrrolidone, then add 300mL toluene, 2 Heat to 140°C with water for 2h under the atmosphere, then distill the water-carrying agent and polymerize at 170°C for 6h, then sink the polymer into water, wash it with deionized water several times, and dry it in vacuum at 100°C for 24h. Formula (i) structure polymer (wherein R 1 , R 2 All are phenyl, z=0.8, n=200).

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Abstract

The invention belongs to the field of polymer materials and particularly relates to a highly-tolerant organic solvent separation membrane and a preparation method thereof. The preparation method includes a), preparing casting liquid into a membrane by a phase transformation method to obtain an asymmetric membrane, wherein the casting liquid includes a solvent and a polymer containing a Schiff basestructure; b), acidizing the asymmetric membrane in an acid solution to obtain the highly-tolerant organic solvent separation membrane. In the method, the polymer polyether-ether-ketone (PEEKt) containing the Schiff base structure is taken as the raw material for making the membrane, and the PEEK separation membrane with excellent organic solvent resistance can be prepared under mild conditions;in addition, in the preparation method, pore size and filtration accuracy of the membrane can be controlled by further adjusting the formula of the casting liquid, and the separation accuracy and application range of the prepared membrane material cover the whole series of membranes, such as microfiltration, ultrafiltration, nanofiltration, reverse osmosis, positive osmosis, dialysis, pervaporation.

Description

technical field [0001] The invention belongs to the field of polymer materials, and in particular relates to a highly resistant organic solvent separation membrane and a preparation method thereof. Background technique [0002] Polymeric membrane for separation is a thin film made of polymer or polymer composite material with the function of separating fluid mixture. Membrane separation is based on the selective permeability of the membrane. The separation membrane is used as a spacer layer. Under the driving force of pressure difference, concentration difference or potential difference, the rate of each component in the fluid mixture permeating the membrane is different, so that it is separated from the membrane. The two sides are enriched separately to achieve the purpose of separation, purification, concentration and recycling. [0003] Currently, conventional polymer separation membranes cannot be used in organic solvents. Because these membranes will change the pore s...

Claims

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Application Information

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IPC IPC(8): B01D67/00B01D69/04B01D71/76
CPCB01D67/0002B01D69/04B01D71/76
Inventor 张所波孙宇轩张奇峰
Owner CHANGCHUN INST OF APPLIED CHEMISTRY - CHINESE ACAD OF SCI
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