Preparation method of aluminum-based high reflector for vacuum ultraviolet wave band

A technology of vacuum ultraviolet and high reflection mirror, which is applied in the direction of mirrors, optics, instruments, etc., can solve the problems such as the working environment that cannot be applied to the 105-115nm band, and achieve the effect of high repeatability and controllability

Active Publication Date: 2019-08-16
TONGJI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, none of the above high reflective mirrors are suitable for the working environment in the 105-115nm band

Method used

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  • Preparation method of aluminum-based high reflector for vacuum ultraviolet wave band
  • Preparation method of aluminum-based high reflector for vacuum ultraviolet wave band
  • Preparation method of aluminum-based high reflector for vacuum ultraviolet wave band

Examples

Experimental program
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Effect test

Embodiment 1

[0036] This embodiment provides a method for preparing an aluminum-based high-reflection mirror used in the vacuum ultraviolet band, such as figure 1 shown, including the following steps:

[0037] (1) Clean the substrate, dry it with nitrogen gas and install it on the sample holder of the coating machine. The surface roughness value Rq of the substrate is about 1.0 nm. Vacuumize the vacuum chamber of the coating machine to complete the vacuum preparation before coating;

[0038](2) Adjust the working current of the evaporation boat equipped with Al film material to 5A, and the working current of the evaporation boat equipped with LiF film material to 40A, perform preheating and degassing, and control the rotation of the sample holder equipped with the substrate at the same time. Adjust the working current of the evaporation boat equipped with Al film material to 40A. The deposition rate and film thickness are monitored by a crystal oscillator, and the thickness of the Al fil...

Embodiment 2

[0059] Compared with Example 1, most of them are the same, except in this example:

[0060] The thickness of the Al film is about 60nm, the target thickness of the LiF film is about 9nm, the MgF 2 The target thickness of the film is about 2 nm.

Embodiment 3

[0062] Compared with Example 1, most of them are the same, except in this example:

[0063] The thickness of the Al film is about 80nm, the target thickness of the LiF film is about 17nm, the MgF 2 The target thickness of the film is about 5 nm.

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Abstract

The invention relates to a preparation method of an aluminum-based high reflector for a vacuum ultraviolet wave band, and the method comprises the following steps: (1) placing a cleaned substrate in avacuum chamber of a film plating machine, and evaporating a layer of Al film; (2) continuously evaporating a layer of LiF film on the Al film in the step (1) to obtain an Al/LiF substrate; (3) underthe heating condition, continuously evaporating a layer of MgF2 film on the LiF film of the Al/LiF substrate in the step (2); and (4) stopping heating and naturally cooling to obtain the target product. Compared with the prior art, the reflectivity of the prepared Al/LiF/MgF2 reflector in the wavelength band below 115 nm of vacuum ultraviolet is better than the of the reflector in the wavelength band, the method has high process repeatability and strong controllability, and has important applications in the fields of astronomical observation in the vacuum ultraviolet wavelength band, free electron laser devices, construction and application of synchronous radiation beamlines.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and relates to a preparation method of an aluminum-based high reflection mirror used in the vacuum ultraviolet band. Background technique [0002] High reflective mirrors are one of the important optical components for astronomical observations in the vacuum ultraviolet band and free electron laser devices. Since Al film has the highest intrinsic reflectivity and good adhesion of any known film material in the ultraviolet spectral region above 100nm, Al is the preferred material for high reflective components in this band. Al mirrors are used in the coating optical components of many vacuum ultraviolet missions, including the International Ultraviolet Exploration Mission (IUE), Space Telescope Axial Displacement Correction Optical System (COSTAR), Goddard High Resolution Spectrometer (GHRS), space Telescope Imaging Spectrograph (STIS), Cosmic Origins Spectrograph (COS), etc. When usi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/36G02B5/08
CPCC03C17/36C03C17/3605C03C17/3621G02B5/0808G02B5/0891
Inventor 王风丽李双莹王占山
Owner TONGJI UNIV
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