A micro-heater with micro-nano structure reinforcement and its preparation method
A technology of micro-nano structure and micro-heater, applied in micro-structure technology, micro-structure device, manufacturing micro-structure device, etc., can solve the problem of thermal stability and insufficient light radiation, high power consumption, and high heat loss of two-dimensional micro-heater problem, to achieve the effect of low power consumption, reduced heat loss, and strong thermal stability
Active Publication Date: 2021-10-29
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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[0006] The purpose of the present invention is to provide a micro-heater with micro-nano structure enhancement and its preparation method, so as to solve the problems of high heat loss, large power consumption, thermal stability and insufficient light radiation of two-dimensional micro-heaters in the prior art
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[0037] The present invention will be further described below in conjunction with specific embodiments. It should be understood that the following examples are only used to illustrate the present invention but not to limit the scope of the present invention.
[0038] According to a preferred embodiment of the present invention, a method for preparing a micro heater with micro-nano structure enhancement is provided, the specific steps are as follows:
[0039] 1) Select a (100) double-sided polished single-crystal silicon substrate 1, the major trimming direction of the wafer is crystal direction, the wafer size is 4 inches, the thickness is 400um ~ 420um, the resistivity 3-8 ohm cm, the doping type is N type, such as figure 1 shown. In fact, the semiconductor substrate selected in this step S1 is not limited to a single crystal silicon substrate, and may also be an SOI substrate, a germanium substrate, and the like.
[0040] 2) Perform standard cleaning on the single crystal...
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Abstract
The invention provides a micro-heater with micro-nano structure enhancement and a preparation method thereof, comprising the steps of: providing a semiconductor single crystal substrate, preparing a film mask on the surface of the substrate, and etching a window array; using wet technology to etch the lining On the bottom surface, a micro-nano pyramid structure is formed on the surface; the film mask is removed, a film is prepared on the surface of the substrate, and a micro-nano structure film is prepared on the surface of the micro-nano pyramid structure; metal deposition technology and metal film patterning technology are used in the Prepare micro-heater resistance wires and electrodes on the surface of the micro-nano structure film; pattern the film and etch the film to form a release area; and release the micro-nano structure film by using dry etching technology or wet etching technology. The invention adopts micro-processing technology, changes its heat conduction characteristics through the micro-nano structure of the film, can significantly reduce heat loss, enhance light radiation, and open up new opportunities for obtaining micro-heaters with low power consumption and strong thermal stability and light sources with strong radiation the way.
Description
technical field [0001] The invention relates to the field of MEMS sensor manufacturing, more particularly to a micro heater with micro-nano structure reinforcement and a preparation method thereof. Background technique [0002] With the continuous development of micro-processing technology, micro-heaters based on MEMS technology have begun to be widely used in the fields of gas detection, environmental monitoring and infrared light sources. However, due to the diversity and complexity of detector application environments, people have increasingly strong requirements for micro heaters with low power consumption, low cost, high performance, and high reliability. How to make low-power and high-performance micro-heaters has become a research hotspot in this field. [0003] At present, MEMS micro-heaters based on silicon substrates are mainly divided into two categories according to different support methods, one is the closed membrane type, and the other is the cantilever membr...
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IPC IPC(8): B81C1/00
CPCB81C1/00349B81C1/00404
Inventor 李铁何云乾刘延祥王跃林
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI