Micro-heater with enhanced micro-nano structure and preparation method of micro-heater
A technology of micro-nano structure and micro-heater, which is applied in the direction of micro-structure technology, micro-structure device, manufacturing micro-structure device, etc., can solve thermal stability and insufficient light radiation, high heat loss and high power consumption of two-dimensional micro-heater and other issues to achieve low power consumption, reduced heat loss, and strong thermal stability
Active Publication Date: 2019-08-30
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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[0006] The purpose of the present invention is to provide a micro-heater with micro-nano structure enhancement and its preparation method, so as to solve the problems of high heat loss, large power consumption, thermal stability and insufficient light radiation of two-dimensional micro-heaters in the prior art
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[0037] The present invention will be further described below in conjunction with specific embodiments. It should be understood that the following examples are only used to illustrate the present invention and not to limit the scope of the present invention.
[0038] According to a preferred embodiment of the present invention, there is provided a method for preparing a micro heater with enhanced micro-nano structure. The specific steps are as follows:
[0039] 1) Choose a double-sided polished monocrystalline silicon substrate with a (100) crystal plane, and the crystal orientation of the large cut edge of the wafer is Crystal orientation, wafer size is 4 inches, thickness is 400um~420um, resistivity is 3~8 ohm cm, doping type is N type, such as figure 1 Shown. In fact, the semiconductor substrate selected in this step S1 is not limited to a single crystal silicon substrate, but may also be an SOI substrate or a germanium substrate.
[0040] 2) Perform standard cleaning on the sing...
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Abstract
The invention provides a micro-heater with an enhanced micro-nano structure and a preparation method thereof, and the method comprises the following steps: providing a semiconductor single crystal substrate, preparing a thin film mask on the surface of the substrate, and etching a window array; corroding the surface of the substrate by adopting a wet process technology, and forming a micro-nano pyramid structure on the surface; removing the film mask, preparing a film on the surface of the substrate, and preparing a micro-nano structure film on the surface of the micro-nano pyramid structure;preparing a micro-heater resistance wire and an electrode on the surface of the micro-nano structure film by adopting a metal deposition technology and a metal film patterning technology; performing patterning and thin film etching on the thin film to form a release region; and releasing the micro-nano structure thin film by adopting a dry etching technology or a wet etching technology to obtain the micro-heater with an enhanced micro-nano structure. The micro-processing technology is adopted, the heat conduction characteristic of the film is changed through the micro-nano structure of the film, heat loss can be remarkably reduced, optical radiation is enhanced, and a new way is opened up for obtaining a micro-heater with low power consumption and high heat stability and a high-radiation light source.
Description
Technical field [0001] The present invention relates to the field of MEMS sensor manufacturing, and more specifically to a micro heater with enhanced micro-nano structure and a preparation method thereof. Background technique [0002] With the continuous development of micro-processing technology, micro heaters based on MEMS technology have begun to be widely used in gas detection, environmental monitoring and infrared light sources. However, due to the diversity and complexity of the detector application environment, people have increasingly strong requirements for low power consumption, low cost, high performance, and high reliability of micro heaters. How to make low-power high-performance micro-heaters has become a research focus in this field. [0003] At present, MEMS micro heaters based on silicon substrates are mainly divided into two categories according to different support methods, one is a closed membrane type, and the other is a cantilever membrane type. The closed f...
Claims
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IPC IPC(8): B81C1/00
CPCB81C1/00349B81C1/00404
Inventor 李铁何云乾刘延祥王跃林
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI