Electrodeposition method for coating electrochromic film and electrochromic device

Abstract

The invention discloses an electrodeposition method for coating an electrochromic film and an electrochromic device. The electrodeposition method comprises the following steps: providing a first conductive substrate and a second conductive substrate; pretreating the first conductive substrate and the second conductive substrate to remove pollutants on the surfaces of the first conductive substrateand the second conductive substrate; preparing an electrodeposition solution; preparing a counter electrode, and arranging an OER catalyst on the first conductive substrate; vertically immersing thesecond conductive substrate and the counter electrode into the electrodeposition solution, loading a voltage on the two, wherein the counter electrode is set to be positive bias voltage, and the second conductive substrate is set to be negative bias voltage, so that a uniform tungsten-based blue film is formed on the surface of the second conductive substrate serving as a cathode, and the electrochromic device is manufactured. The electrodeposition method at least has one or more of the following advantages: vacuum-free, easy control, rapid prototyping, material saving and high cost performance. The invention also comprises the electrochromic device prepared by the method.

Description

technical field [0001] The invention belongs to the technical field of electrochromism, in particular to an electrodeposition method and an electrochromic device for coating an electrochromic film. Background technique [0002] At present, most color-adjustable sunglasses use photochromic materials. However, the transition between the transparent state and the colored state of the photochromic lens takes 5 minutes or more, and it is artificially uncontrollable, resulting in a poor user experience. Therefore, the electrochromic material with faster discoloration and artificial control provides better technical support for the discoloration lens. At the same time, this electrochromic material can also be triggered by light to change color by embedding a photoresistor, realizing two modes of manual control and automatic control. Electrochromic materials are also used in some other fields, such as the use of electrochromic materials on smart windows can automatically block hea...

AI Technical Summary

Problems solved by technology

However, each of the above methods has its own disadvantages that hinder its application

For example, the CVD method requires very expensive equipment and a high temperature of about 500°C to maintain the deposition rate, and it is also very difficult to obtain highly conformal films on special shapes.

The sputtering method requires complex equipment, vacuum chambers, and inert or reactive gases, which undoubtedly increases manufacturing costs

Since X-rays cause ionization of gas molecules, electron beam evaporation can contaminate the sample surface

The plasma polymerization method also needs to be completed under vacuum conditions, which will undoubtedly increase the cost. At the same time, for large-scale films, the low deposition rate characteristics of the plasma polymerization method can only deposit very thin films

Finally, for the spin coating method, although no or less vacuum environment and expensive equipment are used in the process of manufacturing thin film coatings, the spin coating process is limited by the rotating plate, so only small-sized samples can be coated

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