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Preparation method of high-activity g-C3N4 photocatalytic material with lamellar cracked microstructure

A photocatalytic material, g-c3n4 technology, applied in the field of photocatalytic materials, can solve the problems of high recombination rate of photogenerated carriers, unfavorable photocatalytic reaction, low photocatalytic activity, etc., to achieve broadened optical absorption range, simple process, The effect of enhanced photocatalytic activity

Inactive Publication Date: 2019-11-12
YANCHENG INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] (1) g-C prepared by traditional method 3 N 4 The photogenerated carrier recombination rate is high, resulting in its photocatalytic activity is still low
[0007] (2) Most of the methods disclosed in the previous literature and patents are to improve the g-C by noble metal modification, non-metal doping, surface compound semiconductor, etc. 3 N 4 photocatalytic activity, these methods are often multi-step synthesis reactions, the preparation process is more complicated, and the cost is higher
[0008] (3) g-C prepared by traditional method 3 N 4 The specific surface area is small, which is not conducive to photocatalytic reactions

Method used

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  • Preparation method of high-activity g-C3N4 photocatalytic material with lamellar cracked microstructure
  • Preparation method of high-activity g-C3N4 photocatalytic material with lamellar cracked microstructure
  • Preparation method of high-activity g-C3N4 photocatalytic material with lamellar cracked microstructure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Weigh 10g of urea with an electronic analytical balance, then weigh 1.0g of 2-ethylimidazole, put it into a mortar and grind it for 20min, then put it into a 100ml crucible, cover it, and place it in a muffle furnace with Sample 2 was obtained by heating at a rate of 5°C / min, calcination at a high temperature of 550°C for 2 h, and cooling to room temperature naturally. The XRD spectrum shows that the diffraction peak of sample 2 at 13.2° belongs to g-C 3 N 4 The (100) crystal plane; the 27.4° diffraction peak belongs to g-C 3 N 4 The (002) crystal plane of , corresponds to the interlayer stacking and planar structure filling in the aromatic ring system. Compared with the pure g-C in Comparative Example 1 3 N 4 Compared with the diffraction peaks, their diffraction characteristics are similar, and no other diffraction peaks appear, but the intensity of its diffraction peaks is significantly reduced after modification, and the half-peak width increases, indicating t...

Embodiment 2

[0035] Weigh 10g of urea with an electronic analytical balance, then weigh 1.6g of 2-ethylimidazole, put it into a mortar and grind it for 20min, then put it into a 100ml crucible, cover it, and place it in a muffle furnace with Sample 3 was obtained by heating at a rate of 5°C / min, calcination at a high temperature of 550°C for 2 h, and cooling to room temperature naturally. The XRD spectrum shows that adding 1.6g of 2-ethylimidazole g-C 3 N 4 In sample 3, two characteristic peaks appeared at both the 13.2° (100) crystal plane and the 27.4° (002) crystal plane, corresponding to the interlayer superposition and planar structure filling in the aromatic ring system. Pure g-C prepared in Comparative Example 1 3 N 4 Compared with the diffraction peaks, the XRD diffraction characteristics of sample 3 are similar, and no other diffraction peaks appear, indicating that it is still g-C after modification. 3 N 4 crystal phase. Compared with the sample prepared in Example 1, with...

Embodiment 3

[0037] Weigh 10g of urea with an electronic analytical balance, then weigh 2g of 2-ethylimidazole, put it into a mortar and grind for 20min, then put it into a 100ml crucible, cover it, and place it in a muffle furnace with 5 ℃ / min heating rate, calcination at a high temperature of 550 ℃ for 2 hours, and natural cooling to room temperature to obtain sample 4. The XRD spectrum shows that the sample 4 added with 2.0g of 2-ethylimidazole has two characteristic peaks at the 13.2° (100) crystal plane and 27.4° (002) crystal plane, corresponding to the layer in the aromatic ring system Overlapping and filling of planar structures. Pure g-C prepared in Comparative Example 1 3 N 4 Compared with the diffraction peaks, the XRD diffraction characteristics of sample 4 are similar, and no other diffraction peaks appear, indicating that it is still g-C after modification. 3 N 4 crystal phase. Compared with the sample prepared in Example 2, as the amount of 2-ethylimidazole increases, ...

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Abstract

The invention discloses a preparation method of a high-activity g-C3N4 photocatalytic material with a lamellar cracked microstructure. Urea and 2-ethylimidazole are mixed and ground, and then put intoa crucible to be covered with a cover, then the crucible is placed into a muffle furnace to be heated up to 520-580 DEG C for calcination, then cooling is conducted to the room temperature, and thenthe modified high-activity g-C3N4 photocatalytic material with the lamellar cracked microstructure is obtained. The 2-ethylimidazole is added in the process of synthesizing g-C3N4, the microstructureof the g-C3N4 is decorated and modified through reducing gas such as NO and CO released by combustion of the 2-ethylimidazole in the high-temperature calcination process, thus an energy band structureof the g-C3N4 is regulated and controlled so as to broaden the photoresponse range and promote visible light absorption, and the migration rate of light-generated electrons is increased; the g-C3N4 is provided with the lamellar cracked microstructure, and thus the specific surface area of the g-C3N4 is increased; and under the combined action of broadening the optical absorption range, increasingthe light-generated electron migration rate and increasing the specific surface area, photocatalytic activity is enhanced greatly.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic materials, in particular to a highly active g-C with layered cracking microstructure 3 N 4 Preparation methods of photocatalytic materials. Background technique [0002] With the rapid consumption of global fossil energy, the environment is gradually deteriorating. Now the most common pollutant in domestic wastewater is hexavalent chromium (Cr 6+ ), so human studies use photocatalytic technology to reduce Cr 6+ . Graphite carbon nitride (g-C 3 N 4 ) is a new type of visible light catalyst that has been developed rapidly in recent years and has received extensive attention from humans. g-C 3 N 4 It is an electron-rich organic semiconductor metal-free photocatalyst capable of producing hydrogen and oxygen under ultraviolet and visible light. In the presence of a suitable sacrificial electron acceptor or donor, respectively, g-C 3 N 4 The catalyst does not require metal promoters a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24B01J35/10C02F1/30C02F101/22
CPCB01J27/24C02F1/30C02F2101/22C02F2305/10B01J35/61B01J35/39
Inventor 董鹏玉毛健奚新国李梦妮孟承启罗虎陆聪
Owner YANCHENG INST OF TECH